Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photosensitive letterpress printing original plate

A letterpress printing and photosensitivity technology, applied in the field of photosensitive letterpress printing original plate, can solve problems such as poor damage resistance, increased layer thickness, poor dispersion state of carbon black, etc., and achieve high light blocking and improved dispersion

Active Publication Date: 2011-07-13
TOYOBO MC CORP
View PDF11 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the case of nylon resin, although the damage resistance of the thermal mask layer is good, the dispersion state of carbon black is not good, and in order to achieve the specified optical density, it is necessary to increase the layer thickness
On the other hand, in the case of using polyvinyl alcohol resin, there is a disadvantage that the damage resistance of the film is poor.
Also in the case of thermally decomposable polymers, unsatisfactory ablation efficiency cannot be obtained

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive letterpress printing original plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0043] The present invention is specifically given below through examples, but the present invention is not limited to these examples.

[0044] Preparation of Dispersed Binder

[0045] As the dispersion binder, prepare butyral resin, polyamide containing tertiary amino group, polyamide containing ether group, polyamide containing quaternary ammonium salt group, polyamide containing sulfonic acid group, polyamide containing no polar group polyamide and polyvinyl alcohol. As the butyral resin, BM-5 manufactured by Sekisui Chemical Co., Ltd. was used. As the polyamide containing a tertiary amino group, the polyamide containing a quaternary ammonium salt group, and the polyamide containing a sulfonic acid group, polyamides synthesized as follows are used. Macromelt 6900 produced by Henkel was used as the polyamide not containing a polar group. As the polyvinyl alcohol, GH23 manufactured by Nippon Synthetic Chemicals Co., Ltd. was used.

[0046] Synthesis of polyamides conta...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
wavelengthaaaaaaaaaa
melting pointaaaaaaaaaa
number average molecular weightaaaaaaaaaa
Login to View More

Abstract

Disclosed is a photosensitive letterpress printing original plate which has a thin heat-sensitive mask layer having high light blocking performance and scratch resistance. Specifically disclosed is a photosensitive letterpress printing original plate wherein at least a supporting body (A), a photosensitive resin layer (B) and a heat-sensitive mask layer (C) are sequentially arranged. The photosensitive letterpress printing original plate is characterized in that the heat-sensitive mask layer (C) contains carbon black and a dispersion binder therefor which is composed of a butyral resin and a polar group-containing polyamide selected from the group consisting of tertiary amine group-containing polyamides, quaternary ammonium salt group-containing polyamides, ether group-containing polyamides and sulfonic acid group-containing polyamides.

Description

technical field [0001] The present invention relates to a photosensitive letterpress printing original plate for producing letterpress printing plates by computer platemaking technology, and particularly to a photosensitive letterpress printing original plate including a heat-sensitive mask layer as a thin film and having high light-shielding properties and damage resistance. Background technique [0002] In recent years, in the field of letterpress printing, computer to plate technology (Computer to Plate, CTP technology) known as a digital image forming technology has gradually become a very common technology. CTP technology is a method of directly outputting processed information on a computer to obtain a concave-convex pattern that constitutes relief. This technology eliminates the need for negative film manufacturing steps, reducing costs and the time required for negative film production. [0003] In CTP technology, in order to cover the areas that should not be polym...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/095B41N1/12G03F7/00G03F7/004
CPCG03F7/202
Inventor 八和田雪美本井庆一河上哲真芳本和也和田通
Owner TOYOBO MC CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com