A decorative substrate, especially an artificial jewellery stone with a colour effect, and a method for achieving the colour effect for a decorative transparent substrate
一种透明基材、基材的技术,应用在投光效果为特点的图样、装饰艺术、特种装饰结构等方向,能够解决颜色深浅变化等问题
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example 1
[0024] The rear side of ground and polished glass stones made of colorless blanks has been successfully covered with optical adjustment layers, reflective layers and intervening layers. The optical adjustment layer was formed of titanium oxide with a thickness of 40 nm. This layer can be produced by reactive magnetron sputtering from a titanium target in an atmosphere of argon and oxygen at a gas pressure of 0.5 Pa. The reflective layer is formed of silver with a thickness of 80 nm, which ensures reflection of the maximum possible amount of incident light. This layer can be produced by sputtering from a silver target in an inert argon atmosphere at a pressure of 0.5 Pa. The intervening layer is formed of titanium with a thickness of 80 nm. This layer can be produced by sputtering from a titanium target in an inert argon atmosphere at a pressure of 0.5 Pa. Deposition laboratory equipment operating on the principle of magnetron sputtering was used to form the layers. Deposit...
example 2
[0026] The rear side of ground and polished glass stones made of colorless blanks has been successfully covered with optical adjustment layers, adhesive layers, reflective layers and intervening layers. The optical adjustment layer was formed of titanium oxide with a thickness of 50 nm. This layer can be produced by reactive magnetron sputtering from a titanium target in an atmosphere of argon and oxygen at a gas pressure of 0.5 Pa. The adhesive layer was formed of alumina with a thickness of 3 nm. The reflective layer is formed of aluminum bronze alloy CuAl10Fe1 with a thickness of 100 nm. This layer can be produced by sputtering from an alloy target in an inert argon atmosphere at a pressure of 0.5 Pa. The intervening layer was formed of titanium with a thickness of 40 nm. This layer can be produced by sputtering from a titanium target in an inert argon atmosphere at a pressure of 0.5 Pa. Deposition laboratory equipment operating on the principle of magnetron sputtering ...
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