High-thermal conductive metal base plate used for transferring gallium nitride epitaxial layer of LED and preparation method thereof
A metal substrate, high thermal conductivity technology, used in semiconductor devices, electrical components, circuits, etc., can solve problems such as affecting processing, large differences in expansion coefficients, and cracking of gallium nitride epitaxial layers, to prevent cracking and improve service life. Long, low production cost effect
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Embodiment 1
[0025] On the surface of the substrate grown with gallium nitride, a layer of metal chromium is sputtered to realize its conductivity. Then use the electroplating process to plate a layer of metal tin on the surface of the conductive substrate; then through the electroless plating process, plate a layer of metal gold on it; the metal coating tin and gold are alternately plated three times to obtain nitrogen for LED The buffer structure for GaN epitaxial layer transfer; then thicken by electroplating copper, and finally grow a layer of gold on the copper surface by sputtering process; then a high thermal conductivity metal substrate for GaN epitaxial layer transfer for LED can be obtained.
Embodiment 2
[0027] On the surface of the substrate on which gallium nitride is grown, a layer of metal gold is sputtered to realize its conductivity. Then use the electroplating process to plate a layer of metal copper on the surface of the conductive substrate; then through the electroless plating process, plate a layer of metal tin on it; the metal plating tin and copper are alternated three times to obtain the nitride for LED The buffer structure for the transfer of the gallium epitaxial layer; then it is thickened by electroplating copper, and finally a layer of gold is plated on the copper surface through the electroless plating process; then a high thermal conductivity metal substrate for the transfer of the gallium nitride epitaxial layer for LED can be obtained.
Embodiment 3
[0029] On the surface of the substrate on which gallium nitride is grown, a layer of metal gold is sputtered to realize its conductivity. Then use the electroplating process to plate a layer of metal nickel on the surface of the conductive substrate; then ion plating process, plate a layer of metal aluminum on it; the metal plating nickel and aluminum alternate three times to obtain gallium nitride for LED Buffer structure for epitaxial layer transfer; then thickened by electroplating copper; finally, a layer of metal platinum is grown on the copper surface by sputtering process; then a high thermal conductivity metal substrate for silicon-based gallium nitride epitaxial layer transfer for LED can be obtained.
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