Double-pulse cyanide-free alkali silver electroplating method
An acid electroplating and double pulse technology, applied in the fields of cyanide-free silver electroplating technology and pulse electroplating technology, can solve the problems of endangering the health of operators, high toxicity of cyanide plating solution, serious environmental pollution, etc., and achieve a wide range of process parameters, Strong throwing and coverage, strong bonding effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0017] The recipe for double-pulse cyanide-free silver plating is:
[0018] Silver nitrate 35g / L; sodium thiosulfate 180g / L; ammonium thiosulfate 50g / L; sodium metabisulfite 45g / L; sodium sulfate 10g / L; boric acid 25g / L; gelatin: 0.3g / L.
[0019] The process conditions of double-pulse cyanide-free silver plating are as follows: the duty cycle of forward and reverse pulses is 10% and 10% respectively, and the average current density of forward and reverse pulses is 1.0A / dm respectively. 2 and 0.1A / dm 2 . The forward and reverse pulse working time is 100ms and 10ms respectively. The pH value of the electroplating solution is between 4.0 and 4.5, the temperature of the plating solution is 25° C., and the mechanical stirring speed is 100 rpm to 150 rpm.
Embodiment 2
[0021] The formula and process conditions of the double-pulse cyanide-free electroplating silver are basically the same as in Example 1, except that the average current density of the forward and reverse pulses is 2.0A / dm respectively 2 and 0.2A / dm 2 .
Embodiment 3
[0023] The formula and process conditions of double-pulse cyanide-free electroplating silver are basically the same as in Example 1, except that the average current density of forward and reverse pulses is 3.0A / dm respectively 2 and 0.3A / dm 2 .
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com