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Resist stripping composition

A technology of resist stripping agent and composition, which is applied in optics, instruments, optomechanical equipment, etc., can solve the problems of reduced stripping speed, achieve the effects of suppressing odor, reducing losses, and being easy to use

Inactive Publication Date: 2010-03-10
TOAGOSEI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The concentration of the resist in the resist stripping solution also depends on the composition of the stripper composition, etc., but even if the resist concentration is as low as 0.1 to 5%, the stripping speed tends to decrease

Method used

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  • Resist stripping composition
  • Resist stripping composition
  • Resist stripping composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～26

[0098] The positive photoresist was coated on a glass substrate to form a coating film with a thickness of 5 μm. The glass substrate formed with this thin film was immersed in a release agent composition having a composition listed in Tables 1 and 2, washed with deionized water, and observed with an optical microscope (manufactured by Nikon OPTIPHOTO Co., Ltd.) to complete the degree of peeling. Make an evaluation. The results are recorded in Tables 1 and 2 together.

[0099] The evaluation criteria are as follows.

[0100] ◎: particularly good, ○: good, ×: poor

[0101] Table 1

[0102]

[0103] Table 2

[0104]

[0105] According to the results of Tables 1 and 2, it can be seen that the stripping agent composition having the composition of the resist stripping agent composition of the present invention or other present inventions has particularly excellent stripping ability if it does not contain a resist, especially When EC and NMP are combined, even if 0.5% by m...

experiment example 27～51

[0108] The copper plate (thickness 1mm) of JIS H3100 C1100P is cut into the size of 0.9cm * 4cm, in 30 milliliters of the kind and the stripping agent composition of mass ratio recorded in table 3, 4, immerse 10 minutes, by ICP-MS (Agilent 7500cs) Measure the metal component (Cu) dissolved in the composition, and evaluate the degree of metal corrosion. The results are recorded in Tables 3 and 4 together.

[0109] The evaluation criteria for corrosion are as follows.

[0110] ◎: Particularly good [amount of leached metal: less than 10 ppb (lower limit of quantification)]

[0111] ○: Good (amount of leached metal: 10 ppb or more and less than 100 ppb)

[0112] △: Defective (amount of dissolved metal: 100ppb or more and less than 400ppb)

[0113] ×: Extremely bad (amount of eluted metal: 400ppb or more)

[0114] table 3

[0115]

[0116] Table 4

[0117]

[0118] From the results of Tables 3 and 4, it can be seen that the stripper composition having the composition of...

experiment example 52～71

[0121] The release agent composition having the composition described in Table 5 was heated at 60° C. or 80° C. for the number of days described in Table 5, and the degree of odor generation of the release agent composition after several days was evaluated by a sensory test. The results are recorded in Table 5 together.

[0122] table 5

[0123]

[0124] From the results in Table 5, it can be seen that all cyclic amides (NMP) and chain amides (DMAc) have no foul odor when not heated, but the foul smell is strong especially when the heating temperature is a high temperature of 80°C. On the other hand, it was found that the resist release agent composition of the present invention containing an amide and other compounds had less bad odor even after heating at 80° C. for 30 days, and was excellent in terms of odor.

[0125] (4) Evaluation of solid liquid

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Abstract

Disclosed is a resist stripping composition which takes a liquid form at a working temperature, hardly causes a metal (e.g., copper) to corrode, is easy to be filtered, and can be re-used readily. Theresist stripping composition comprises a mixture of at least one member selected from a cyclic ester having a 3- to 6-membered ring (e.g., ethylene carbonate, propylene carbonate), a ketone having alower alkyl group (e.g., acetone, methyl ethyl ketone) and a specific alkylene glycol monoalkyl ether (e.g., ethylene glycol monoethyl ether, diethylene glycol monobutyl ether), and a specific cyclicamide (e.g., N-methyl-2-pyrrolidone) or a specific linear amide (e.g., N,N-dimethylacetoamide, N,N-diethylacetoamide).

Description

technical field [0001] The present invention relates to a resist stripper composition. More specifically, the present invention relates to a composition for stripping unnecessary resist after performing resist operation in steps of providing wiring and mounting components on substrates used in semiconductors, liquid crystals, etc., and the composition is relatively A resist stripper composition that does not corrode metals such as copper, is easy to filter and reuse, and can be liquid at the use temperature. Background technique [0002] In general, as resist stripper compositions such as positive photoresist stripper compositions, amines such as monoethanolamine, (2-aminoethoxy)ethanol, and N-methylaminoethanol are used, for example. An amine-based stripper composition as a main component. These amines are used as a stripping solution before the stripping ability is damaged due to consumption or evaporation and dissipation. After use, the entire liquid is exchanged, or pa...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42H01L21/027H01L21/304
CPCG03F7/425C11D3/046G03F7/0045G03F7/0392G03F7/0395G03F7/0397G03F7/422C11D2111/22
Inventor 田口裕务住田正直
Owner TOAGOSEI CO LTD
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