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Coloring light-sensitive resin composition for ultraviolet ray laser, method for forming patterns, optical filter and production method thereof and display device

A technology of photosensitive resin and composition, which is applied in the direction of photolithographic exposure equipment, nonlinear optics, microlithography exposure equipment, etc., can solve the problem of no prompt material, etc., and achieve good color characteristics, high productivity, and line width Highly stable effect

Inactive Publication Date: 2013-03-27
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, no specific materials were suggested, and it is hoped to propose materials suitable for these devices.

Method used

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  • Coloring light-sensitive resin composition for ultraviolet ray laser, method for forming patterns, optical filter and production method thereof and display device
  • Coloring light-sensitive resin composition for ultraviolet ray laser, method for forming patterns, optical filter and production method thereof and display device
  • Coloring light-sensitive resin composition for ultraviolet ray laser, method for forming patterns, optical filter and production method thereof and display device

Examples

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Effect test

Embodiment

[0371] Hereinafter, although an Example demonstrates this invention more concretely, unless the summary is exceeded, this invention is not limited to a following Example. In addition, "part" is based on mass unless otherwise indicated.

[0372] Details of the compounds (compounds 1 to 15) used in Examples and Comparative Examples are shown below.

[0373]

Synthetic example 1

[0374] Synthesis Example 1: Synthesis of Compound 2, the photopolymerization initiator represented by the general formula (I) above

[0375] First, compound D was synthesized according to the following strategy.

[0376] Ethylcarbazole (100.0g, 0.512mol) was dissolved in 260ml of chlorobenzene, and after cooling to 0°C, aluminum chloride (70.3g, 0.527mol) was added. Next, o-chlorotoluene (81.5 g, 0.527 mol) was added dropwise over 40 minutes, the temperature was raised to room temperature, and the mixture was stirred for 3 hours. Then, after cooling to 0°C, aluminum chloride (75.1 g, 0.563 mol) was added. 4-Chlorobutyryl chloride (79.4 g, 0.563 mol) was added dropwise over 40 minutes, warmed up to room temperature, and stirred for 3 hours. The mixed solution of 156 ml of 35 mass % hydrochloric acid aqueous solution and 392 ml of distilled water was cooled to 0 degreeC, and the reaction solution was dripped. The precipitated solid was suction-filtered, washed with distilled ...

Synthetic example 2

[0386] Synthesis Example 2: Synthesis of Compound 3, the photopolymerization initiator represented by the above general formula (I)

[0387] First, the same operation as in Synthesis Example 1 was carried out to synthesize compound D.

[0388]Dissolve the obtained compound D (86.5g, 209mmol) in THF 277ml, add 2,6-dimethylbenzenethiol (30g, 217mmol) and sodium iodide (3.0g, 20.0mmol), and stir at 40°C . Next, sodium hydroxide (8.66 g, 216 mmol) was added to the reaction liquid, and it refluxed at 40 degreeC for 2 hours. Next, after cooling to 0° C., sodium methoxide 28% methanol solution (manufactured by Nippon Shokubai Co., Ltd., SM-28) (48 g, 249 mmol) was added dropwise over 20 minutes, and the temperature was raised to room temperature, followed by stirring for 2 hours. Next, after cooling to 0° C., isoamyl nitrite (29.3 g, 250 mmol) was added dropwise over 20 minutes, the temperature was raised to room temperature, and the mixture was stirred for 3 hours. The reaction s...

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Abstract

The invention provides a coloring light-sensitive resin composition, which has high line width stability relative to development and can form pattern with high resolution, as well as a method for forming patterns using ultraviolet ray laser exposure, and a method for producing an optical filter using the pattern-forming method, a color filter and a display device. The invention especially provides a coloring light-sensitive resin composition which is suitable for forming coloring pixel of color filter or the like, as well as a method for forming patterns using ultraviolet ray laser exposure. The coloring light-sensitive resin composition provided by the invention contains: (A) olefinic bond type unsaturated compound, (B) adhesive resin, (C) colorant, as well as (D) light polymerization initiator shown in the general formula (I). In the general formula (I), R and X respectively and independently represent a monovalent substituent, as well as Y respectively and independently represent adivalent organic group, and Ar represents an aromatic group. N is an integer from 0-5.

Description

technical field [0001] The present invention relates to a colored photosensitive resin composition for ultraviolet laser, a pattern forming method by ultraviolet laser exposure, a method for manufacturing a color filter using the pattern forming method, a color filter, and a display device. Background technique [0002] A color filter is an indispensable component of a liquid crystal display (LCD: Liquid Crystal Display). Compared with display devices using CRT (Cathode Ray Tube), liquid crystal displays are compact and can save power, and through technological progress, their performance is at the same level or higher, so they are used as TV screens, computer screens, and other screens. Display devices are gradually replacing CRTs. [0003] In recent years, the development of liquid crystal displays has progressed from the use of personal computers and monitors with relatively small screen areas to the use of TVs with large screens and high image quality. [0004] In TV a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/00G03F7/20G02B5/20G02F1/1335
CPCC09B11/24G02B1/04G02B5/223G03F7/0007G03F7/027G03F7/031G03F7/032G03F7/033
Inventor 山崎健太疋田政宪土村智孝
Owner FUJIFILM CORP
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