Curing combination for stamping, condensate using the combination and method for producing the same, and members for liquid crystal display device
A technology of curable compositions and mixtures, applied in the photoengraving process of pattern surface, photosensitive materials for optomechanical equipment, nonlinear optics, etc., can solve the problem of no heat resistance, high elastic recovery rate of photocurable and voltage characteristics, etc., to achieve the effect of excellent light transmittance and heat resistance
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Embodiment 1
[0251] According to the composition shown in Table 2 below, photopolymerizable monomers M1 to M3 described in Table 1 below, the following photoradical polymerization initiator P-1, the following surfactants W-1 and W-2, The following antioxidant AO1 was used to prepare the curable imprint composition of Example 1. Here, the numerical values in Table 2 are % by mass.
[0252] Table 1
[0253]
Embodiment 2~66、 comparative example 1~21 and 25~37
[0255] Except having set it as the composition of following Tables 2-6, it carried out similarly to the composition of Example 1, and obtained these compositions.
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