Semi-metal synthetic anti-ferromagnetic structure
A technology for synthesizing antiferromagnetism and semimetals, which is applied in the field of magnetic storage, can solve the problems of increased control energy consumption, increased magnetic switching field strength, and increased demagnetization field, and achieve high storage density, magnetoresistivity and thermal stability The effect of improving and reducing the magnetic switching field
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0008] According to the above structure, the inventors have prepared the following 63 three-layer film structures by using magnetron sputtering or molecular beam epitaxy: the characteristics are based on the semi-metallic material [Co 2 FeAl, Co 2 FeSi, Co 2 MnSi, Co 2 CrAl, Co 2 Fe(Al 1-x Si x )(02 (Fe 1-x mn x ) Si (02 BC type Heusler alloy] is a magnetic layer of synthetic antiferromagnetic structure. The detailed preparation process of the above three-layer film is as follows: the background vacuum degree of the sputtering chamber is 2×10 -5 Pa, the pressure of argon (99.99%) during sputtering is 0.5 Pa, and the substrate is cooled with circulating water.
[0009]
[0010]
[0011]
[0012] Through testing, the above-mentioned devices can realize strong antiferromagnetic coupling in different degrees, and the magnetic switching field is lower than 10Oe. The antiferromagnetic coupling can be maintained above 400 °C. This makes the structure fully applicab...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com