Precision vibration damping assembly and vibration damping platform composed of the assembly

Abstract

The invention discloses a precision damping component and a damping platform composed of the precision damping component, and the damping platform has damping function and positioning function along a Z direction. The precision damping component comprises a passive damping part, an active damping actuator and an external frame. The passive damping part is a piston rod with a structure of double cavities, an air pocket and a pressure cavity are respectively positioned in the two cavities, and the air pocket has larger longitudinal bracing power and lower rigidity, and can isolate the vibration of attenuation high frequency. The active damping actuator is a linear voice coil motor connected in parallel with the passive damping part, and applies acting force to a passive object according to the vibration condition and location information of the controlled object, so as to drive the controlled object to move to a designated position and compensate the vibration. The damping platform composed of at least three precision damping components has the functions of vibration damping with a plurality of degrees of freedom, accurately positioning along the Z direction, focusing and leveling. The precision damping component and the damping platform can be used in the apparatus with precision damping requirements such as mask aligners, ultra-precision numerically-controlled machine tools, biochip scanners and the like.

Description

technical field [0001] The invention belongs to the precision preparation technology, and in particular relates to a precision vibration damping component and a vibration damping platform composed of it. The invention has the functions of precise vibration reduction, precise leveling and focusing, and can be used for high-precision equipment such as photolithography machines, precision machine tools, and precision measuring equipment. Background technique [0002] Lithography machine is a kind of micro-electromechanical equipment with complex structure. The resolution and overlay accuracy reach nanometer level, which is extremely difficult to manufacture and is close to the limit of precision manufacturing technology. The requirements of the lithography machine for the vibration reduction system have also reached an extremely stringent level, which represents the highest difficulty of precision vibration reduction and is also the most typical application object of precision ...

AI Technical Summary

Problems solved by technology

[0003] The vertical positioning accuracy of the mask stage and wafer stage is also the main factor affecting the quality of lithography. In traditional lithography machines, a set of complex leveling and focusing mechanisms are usually used to ensure the vertical positioning accuracy. This will complicate the structure of the motion table, and at the same time make the control more difficult due to the increase of the inertia of the table

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