GaN base spinning LED and preparation method thereof
A light-emitting diode, N-type technology, applied in the field of spintronics, can solve the problems of many growth steps, GaN material carrier concentration and mobility and other electrical properties that are difficult to meet the device, long cycle, etc., to achieve a simple and easy preparation method line effect
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[0028] ITO materials are widely used as transparent electrodes of optoelectronic materials, and GaN-based LED technology with vertical structure is developing and gradually maturing, which has become an inevitable trend in the development of semiconductor lighting field. The present invention combines ITO magnetic material and vertical structure LED technology to prepare Spin-LED, including the following main contents and steps:
[0029] 1) Preparation of vertical GaN-based LED:
[0030] a) Fabrication of traditional GaN-based LEDs
[0031] GaN-based LED chip structures were grown on sapphire substrates by metal organic compound vapor phase epitaxy (MOCVD).
[0032] b) Preparation of P-type ohmic contacts
[0033] Deposit Ni / Au electrodes on P-GaN, and obtain ohmic contact through the alloy.
[0034] c) Substrate transfer
[0035] Cu was electroplated on Ni / Au electrodes, and the substrate was transferred.
[0036] d) Laser lift off sapphire substrate
[0037] The sample...
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