Light absorption layer material for film solar battery and preparation method thereof
A technology for thin-film solar cells and light-absorbing layers, which is applied in the manufacture of circuits, electrical components, and final products to achieve high efficiency, improved uniformity, composition controllability, and high-quality effects
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Embodiment 1
[0027] On the Mo foil, a Cu-Si-Sn alloy prefabricated layer with a thickness of 1.5 μm is formed by simultaneous sputtering deposition of Cu targets, Si targets and Sn targets. The sputtering process parameters are: the distance between the substrate and the target is 6 cm, and the background vacuum 5×10 -4 , the sputtering gas is 99.99% Ar, the sputtering pressure is 1Pa, the sputtering power of each target is 75-125W, and the substrate temperature is room temperature during sputtering. Put the deposited Cu-Si-Sn alloy prefabricated layer into a solid source vulcanization treatment vacuum chamber, and heat it to 600°C with a resistive contact heat source; at the same time, use a resistive contact heat source to heat the solid sulfur source to 200°C, the sulfur atoms and the prefabricated layer The metal atoms of the compound reaction occur, and after 1 hour, the stoichiometric composition is finally obtained as Cu 2 Si 0.45 sn 0.5 6S 3.05 Copper-silicon-tin-sulfur solar c...
Embodiment 2
[0029] CuSiSn alloy target (atomic ratio Cu:Si:Sn=2:0.6:0.4) was deposited on Mo foil by single-target magnetron sputtering to form a Cu-Si-Sn alloy prefabricated layer with a thickness of 2 μm. The sputtering process parameters were : The distance between substrate and target is 8cm, and the background vacuum is 5×10 -4 , the sputtering gas is 99.99% Ar, the sputtering pressure is 1Pa, the sputtering power is 80-120W, and the substrate temperature is room temperature during sputtering. Put the deposited Cu-Si-Sn alloy prefabricated layer into the solid-state source vulcanization treatment vacuum chamber, and heat it to 600°C with a resistive contact heat source; at the same time, use a resistive contact heat source and halogen tungsten lamp to jointly heat the solid-state sulfur source to 240°C , and feed Ar as the carrier gas of protective gas and sulfur vapor; the sulfur atoms react with the metal atoms in the prefabricated layer, and after 1 hour, the stoichiometric compos...
Embodiment 3
[0032] Except that the Si target in Example 1 was replaced by a Ge target, the others were the same as in Example 1, and finally a copper-germanium-tin-sulfur solar cell light absorption layer was obtained.
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