Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

High reflection film of silicon carbide reflection mirror within visible light wave range, and its production method

A technology of internal silicon carbide and mirrors, which is applied in optics, mirrors, optical components, etc., can solve the problems of large difference in hardness and difficult processing of surface finish, and achieve high density, improve surface finish, and improve reflectivity.

Inactive Publication Date: 2008-12-03
HARBIN INST OF TECH
View PDF0 Cites 24 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, since reaction sintered silicon carbide is a composite material composed of silicon carbide and elemental silicon, and the hardness difference between the two materials is relatively large, it is very difficult to process the surface finish in the later stage.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] See the high-reflection film of the silicon carbide mirror in the light band, and use the reaction sintering method to prepare the mirror body with complex shape, and perform basic mechanical processing and surface treatment on the mirror, and then follow the following steps:

[0027] a. Clean the surface of the mirror;

[0028] b. Coating with magnetron sputtering equipment;

[0029] c. Refining the reflective film layer;

[0030] By cyclically repeating the above steps a, b, and c, and replacing the target material in the coating, respectively perform single crystal silicon or polycrystalline silicon dense layer deposition, Ni-Cr alloy transition layer deposition, and reflective layer Ag film deposition protective layer film SiO 2 Deposition, so as to prepare a highly reflective film system composed of four layers of silicon film dense layer, transition layer, reflective layer and protective layer with high surface density.

Embodiment 2

[0032] In the process of processing the high-reflection film of the silicon carbide mirror in the visible light band described in Example 1, the cleaning of the mirror is first cleaned and milled, and then it is put into a large ultrasonic cleaning machine for cleaning. Remove surface attachments, machine with a grinder, process with a light knife for 10 minutes, rinse with deionized water after cleaning, and perform final cleaning with pure ethanol, and use air-drying equipment to speed up its drying speed.

Embodiment 3

[0034] The above-mentioned high-reflection coating of silicon carbide mirrors in the visible light band, the coating is to place the mirror body in the magnetron sputtering equipment, and use single crystal silicon or polycrystalline silicon layer deposition or Ni-Cr alloy or Ag or SiO 2 As a target, particle bombardment is carried out on the mirror body, and the vacuum is started to 10 -4 Pa, filled with Ar gas to make the pressure reach 1Pa. First raise the temperature of the silicon carbide mirror to 500°C, and then bombard it with an ion beam. After this process lasts for 30 minutes, lower the temperature of the mirror to 200°C and start deposition. The deposition power is 150W. The time is 2.5 hours. The film obtained in this way can meet the design requirements.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a high reflective film for a silicon carbide reflecting mirror in the visible light wave band and the preparation method thereof. At present, the reflection factor of the surface of a reflecting mirror in a specific wavelength range is a key index in order to meet the design requirements of equipment such as large space telescopes, large terrestrial telescopes, early-warning satellites, explorer satellites, reconnaissance satellites, meteorological satellites, high energy lasers and laser radars. A reflecting mirror body in a complex shape is prepared by adopting the reactive sintering method, basic mechanical treatment and surface treatment are performed to the reflecting mirror, and then the following steps are adopted: firstly, the surface of the reflecting mirror is cleaned; secondly, filming treatment is performed with a magnetic control sputtering apparatus; and thirdly, the reflecting film layer is fine-finished. The invention is applied to the preparation method for the reflecting film of the silicon carbide reflecting mirror in the visible light wave band with the reflection factor larger than 97 percent.

Description

Technical field: [0001] The invention relates to a method for preparing a reflective film of a silicon carbide reflector with a reflectivity greater than 97% applied in the visible light band. Background technique: [0002] At present, in order to meet the design requirements of large space telescopes, large ground telescopes, early warning satellites, detection satellites, reconnaissance satellites, meteorological satellites, high-energy lasers and lidars, the reflectivity of the mirror surface in a specific wavelength range is a key index of. At present, in order to meet the design requirements of large space telescopes, large ground telescopes, early warning satellites, detection satellites, reconnaissance satellites, meteorological satellites, high-energy lasers and lidars, the reflectivity of the mirror surface in a specific wavelength range is a key index of. Under the same conditions, if the reflector system used can meet the following conditions, the performance of...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B5/08G02B1/10C23C14/35C23C14/14C23C14/10C23C14/54G02B1/18
Inventor 韩杰才张宇民周玉锋孟松鹤杜善义左洪波赫晓东
Owner HARBIN INST OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com