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Method for producing two-dimensional polymer photon crystal using flexible offset printing

A lithography and photonic crystal technology, which is applied in the field of soft lithography to make two-dimensional polymer photonic crystals, can solve the problems of low modulus of PDMS templates, and achieve the effect of high fidelity and high production capacity

Inactive Publication Date: 2008-04-23
SHANDONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, replicating structures with aspect ratios larger than 1 and feature sizes smaller than 500 nm remains a challenge, partly due to the low modulus of PDMS templates.

Method used

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  • Method for producing two-dimensional polymer photon crystal using flexible offset printing
  • Method for producing two-dimensional polymer photon crystal using flexible offset printing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] Example 1: Fabrication of two-dimensional ultraviolet acrylic polymer photonic crystals.

[0033] Materials used in the examples are as follows:

[0034] The ultraviolet acrylic polymer model WIR30-470 is produced and sold by ChemOptics, Korea.

[0035] The electronic etchant is ZEP520A, produced and sold by Japan ZEON Company.

[0036] ZED-N50 solvent: developer for electronic etching adhesive ZEP520A, produced and sold by Japan ZEON Company.

[0037] The PDMS model is Sylgard 184, with a specific gravity of 1.11 and a viscosity of 5000cSt, produced and sold by Dow Coming.

[0038] Proceed as follows:

[0039] (1) Substrate fabrication of triangular cavity structure

[0040]Using JEOL JBX6000 electron beam lithography (EBL) equipment, a layer of electronic etching glue (ER) ZEP520A is coated on the silicon substrate, the pattern is determined and printed by EBL, and the exposed electronic etching glue is in ZED-N50 solvent After development, bake on a baking tray ...

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PUM

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Abstract

The method comprises: making a baseboard with an triangle cavity structure; making a PDMS template and transferring pattern; the obtained handkerchief polymer photon crystal is a trigonal system, and its air cavity diameter is 300nm, and its lattice constant is 600nm; the average depth of the air cavity is 375nm, and the aspect ratio is 1.25(375 / 300); the depth difference between the baseboard and mould pattern is only 3%; the refractive index of the background polymer at 1550nm is 1.475.

Description

technical field [0001] The invention relates to a method for making a two-dimensional photonic crystal, in particular to a two-dimensional polymer photonic crystal with a triangular crystal structure with an aspect ratio greater than 1 and a body size smaller than 500 nm by using a soft lithographic printing technology. Background technique [0002] Nanophotonics has a revolutionary impact on the prospects of photonics technology. Nanostructure-based photonic crystals play an important role in the fabrication of next-generation photonic devices. Photonic crystal is an artificial periodic dielectric structure. The functional devices made with them not only have greatly reduced size but also have excellent characteristics, such as high wavelength and angle sensitivity, large group velocity dispersion. Recently, devices based on two-dimensional photonic crystal thin plates have attracted widespread attention, such as two-dimensional flat photonic structures that can be compar...

Claims

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Application Information

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IPC IPC(8): G03F7/00G02B6/122
Inventor 张飒飒
Owner SHANDONG UNIV
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