Method for preparing nano silicon carbide
A nano-silicon carbide and silicon carbide technology, applied in chemical instruments and methods, single crystal growth, polycrystalline material growth and other directions, can solve the problems of high cost and no preparation of nano-silicon carbide.
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Embodiment 1
[0017] The method for nano silicon carbide is carried out according to the following steps:
[0018] 1) Use vibration to remove impurities in plant cotton (tail cotton);
[0019] 2), put analytically pure silicon powder into a graphite crucible, then place the plant cotton treated in step 1) on the silicon powder, and cover the crucible;
[0020] 3), then put the crucible with the sample into the high-temperature vacuum furnace, and evacuate to 10 -3 After Pa, heat up to 600°C, hold for 30 minutes for carbonization, then heat up to 1400°C for 180 minutes for silicide, and then drop to room temperature with the furnace to produce nano-silicon carbide. The particle size of the prepared nano-silicon carbide is 3-5nm.
Embodiment 2
[0022] The method for nano silicon carbide is carried out according to the following steps:
[0023] 1) Use vibration to remove impurities in waste plant cotton;
[0024] 2), put the analytically pure silicon powder into the graphite crucible, then put the waste plant cotton treated in step 1) on the silicon powder, and cover the crucible;
[0025] 3), then put the crucible with the sample into the high-temperature vacuum furnace, and evacuate to 10 -3 After Pa, raise the temperature to 1000°C, hold for 30 minutes for carbonization, then raise the temperature to 1500°C for 150 minutes for silicide, and then lower the furnace to normal temperature to produce nano-silicon carbide with a particle size of 10-15nm.
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