Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparing method for mesoporous silicon dioxide material

A mesoporous silica and mesoporous structure technology, applied in the direction of silica, silicon oxide, etc., to achieve the effect of reducing production costs and reducing corrosion of production equipment

Inactive Publication Date: 2007-08-15
NANKAI UNIV
View PDF3 Cites 18 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is no report on the synthesis of mesoporous materials at room temperature and neutral conditions using cationic surfactants as structure-directing agents and nitrates as catalysts for hydrolysis and condensation of organosiloxanes.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparing method for mesoporous silicon dioxide material
  • Preparing method for mesoporous silicon dioxide material
  • Preparing method for mesoporous silicon dioxide material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] According to the ratio: 0.2CTAB: 1TEOS: 0.5NaNO 3 : 100H 2 O Add 7.3 g of CTAB, 180 mL of deionized water and 4.25 g of NaNO to the reactor in sequence 3 , stirred until completely dissolved into a transparent solution, at this time the viscosity of the solution is very high. 20.8 g of TEOS was added to the solution, pH = 6, left to react at room temperature for 6 days, and a white mixture was obtained. Filter, wash and dry to obtain a white product. After the product is dried, it is baked at 540°C for 6 hours to remove the templating agent. The XRD pattern of the sample after calcination is shown in Figure 1, and Figure 1 is the powder X-ray diffraction pattern (XRD) of Example 1, which is consistent with the reported mesoporous materials with wormholes. The d value of the mesoporous structure was calculated to be 4.93 nm. The nitrogen adsorption isotherm and the pore size distribution of the sample after roasting are shown in Fig. 2, and Fig. 2 is the nitrogen ad...

Embodiment 2

[0026] According to the ratio: 0.2CTAB: 1TEOS: 0.15NaNO 3 : 100H 2 O 7.3 g of CTAB, 180 mL of deionized water and 1.27 g of NaNO were sequentially added to the reactor 3 , stirred until completely dissolved into a viscous transparent solution. 20.8 g of TEOS was added to this solution, pH = 6, stirred at room temperature for 6 days, and a white mixture was obtained. Filter, wash and dry to obtain a white product. The nitrogen adsorption isotherm and pore size distribution of the product after roasting are shown in Figure 3. The most visible pore size is 3.0nm, and the specific surface area is 541m 2 / g.

Embodiment 3

[0028] According to the ratio: 0.2CTAB: 1TEOS: 0.5Al(NO 3 ) 3 : 100H 2 O sequentially add 7.3g CTAB, 180mL deionized water and 18.8g Al(NO 3 ) 3 , stirred until completely dissolved into a transparent solution, at this time the viscosity of the solution is very high. 20.8 g of TEOS was added to this solution, and the reaction was allowed to stand at room temperature for 3 days to obtain a white mixture. Filter, wash and dry to obtain a white product. The XRD pattern of the product before and after firing is shown in Figure 4, (a) is the XRD pattern of the unroasted product, and (b) is the XRD pattern of the fired product.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Specific surface areaaaaaaaaaaa
Login to View More

Abstract

The invention discloses a making method of dielectric-pore silica, which is characterized by the following: adopting organic siloxane as silicon source and nitrate as hydrolytic condensed catalyst of organic siloxane; synthesizing in the CTAB-TEOS-MNO3-H2O under indoor temperature; obtaining the product with IV-typed curve and specific surface area at 500-1600m2 / g and most probable aperture at 2-4nm; fitting for macromolecular original covering and original fixed-carrying domain.

Description

Technical field: [0001] The present invention relates to a kind of preparation method of mesoporous silicon dioxide material, specifically a kind of under mild (room temperature and neutral) condition, adopt cationic surfactant as template, take nitrate as organosilicon source hydrolytic polymerization Catalysts for preparing mesoporous materials. Background technique: [0002] Since mesoporous silica materials were successfully synthesized in the 1990s (Nature, 359, 710, 1992), due to the wide application prospects of this material in many aspects (Chem. Rev., 97, 2373, 1997), it has become more and more popular It has attracted people's attention and has become a hot spot in material science research. Its preparation method is usually under acidic or alkaline conditions, using cationic surfactants, anionic surfactants or aggregates of nonionic surfactants as templates, and condensing through silicon-oxygen bonds. [0003] Chinese patent CN1579935A discloses a preparation...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C01B33/18
Inventor 陈铁红肖强丁大同
Owner NANKAI UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com