Method of preparing antifriction I1F-WS2/IF-MoS2 composite film by magnetic controlled sputtering

A technology of IF-WS2 and magnetron sputtering, which is applied in the preparation field of solid lubrication technology, can solve the problems of low bonding strength, insufficient film load capacity and wear resistance failure, etc., and achieve the improvement of load capacity and wear resistance, The deposition process is easy to control and the effect of excellent wear resistance

Inactive Publication Date: 2008-05-14
SHANGHAI JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But pure IF-WS 2 or IF-MoS 2 Due to the low bonding strength of the film with the metal matrix, the film's insufficient bearing capacity and wear resistance under heavy loads will also cause premature failure.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0010] Embodiment 1: Polish the stainless steel substrate to a smoothness of less than 0.05 μm, clean it with alcohol and acetone in an ultrasonic cleaner, dry it, and put it into a sputtering chamber. Vacuum to 10 -3 Pa, argon gas is introduced, the pressure in the vacuum chamber is adjusted to 0.4Pa, the bias voltage of the substrate is -100V, IF-MoS 2 Target RF sputtering, power 150W, IF-WS 2 The target is used for DC sputtering with a power of 120W, and the Ni target is used for DC sputtering with a power of 100W. Before sputtering, the target was cleaned for 1 hour, and the substrate was cleaned with an auxiliary ion source for 30 minutes. Then, the Ni target was sputtered for 5 minutes, with a thickness of about 50nm, and then the Ni power was turned off, and the IF-MoS 2 and IF-WS 2 The target starts co-sputtering according to the predetermined power, and the sputtering time is 2 hours. After the temperature of the vacuum chamber drops to room temperature, the vacuu...

Embodiment 2

[0011] Embodiment 2: Polish the stainless steel substrate to a smoothness of less than 0.05 μm, clean it with alcohol and acetone in an ultrasonic cleaner, dry it, and put it into a sputtering chamber. Vacuum to 10 -3 Pa, enter argon gas, adjust the air pressure in the vacuum chamber to 0.1Pa, and the bias voltage of the substrate to -100V, IF-MoS 2 RF sputtering for target, power 300W, IF-WS 2 The target is used for DC sputtering with a power of 100W, and the Ni target is used for DC sputtering with a power of 100W. Before sputtering, the target was cleaned for 1 hour, and the substrate was cleaned with an auxiliary ion source for 30 minutes. Then, the Ni target was sputtered for 3 minutes, with a thickness of about 50nm, and then the Ni power was turned off, and the IF-MoS 2 and IF-WS 2 The target starts co-sputtering according to the predetermined power, and the sputtering time is 2 hours. After the temperature of the vacuum chamber drops to room temperature, the vacuum...

Embodiment 3

[0012] Embodiment 3: Polish the stainless steel substrate to a smoothness of less than 0.05 μm, clean it with alcohol and acetone in an ultrasonic cleaner, dry it, and put it into a sputtering chamber. Vacuum to 10 -3 Pa, enter argon gas, adjust the pressure in the vacuum chamber to 1Pa, and the bias voltage of the substrate to -100V, IF-MoS 2 RF sputtering for target, power 100W, IF-WS 2 The target is used for DC sputtering with a power of 100W, and the Ni target is used for DC sputtering with a power of 300W. Before sputtering, the target was cleaned for 1 hour, and the substrate was cleaned with an auxiliary ion source for 30 minutes. Then, the Ni target was sputtered for 7 minutes, with a thickness of about 50nm, and then the Ni power was turned off, and the IF-MoS 2 and IF-WS 2 The target starts co-sputtering according to the predetermined power, and the sputtering time is 2 hours. After the temperature of the vacuum chamber drops to room temperature, the vacuum chamb...

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Abstract

A process for preparing an antifriction IF-WS2 / IF-MoS2 film features that under the proper technological parameters, the IF-WS2 and IF-MoS2 are used for co-sputtering to obtain said antifriction film. Its advantages are low friction coefficient, high resistance to moisture, oxidizing and wearing, and high adhesion to substrate.

Description

technical field [0001] The invention relates to a preparation method in the technical field of solid lubrication, in particular to a method for preparing anti-friction IF-WS by magnetron sputtering 2 / IF-MoS 2 Composite film method. Background technique [0002] Ordinary layered structure (2H) transition metal sulfide WS 2 、MoS 2 The crystal is a hexagonal structure formed by S-M-S (M=W, Mo) atoms. In each layer, the S-M atoms are bonded by strong covalent bonds, and the layers are bonded by weak van der Waals bonds. , easy to slide between layers. As a solid lubricant, 2H-WS 2 , 2H-MoS 2 In a vacuum environment, it has the advantages of small friction coefficient, large bearing capacity, and good wear resistance, and also has the advantages of strong bonding with the substrate, low evaporation rate, and radiation resistance. But due to the layered structure of WS 2 、MoS 2 The unsaturated dangling bonds at the edge of the crystal are chemically active, and are easil...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/54C23C14/06
Inventor 何丹农尹桂林涂江平夏正志余震
Owner SHANGHAI JIAOTONG UNIV
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