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Stannane Gas Supply System

a technology of stannane gas supply and supply system, which is applied in the direction of refrigeration, lighting and heating apparatus, refrigeration safety arrangement, etc., can solve the problems of extremely difficult handling of stannane gas supply and the supply of stannane, and achieve the effect of stable flow rate and stably radiating the extreme ultraviolet rays

Inactive Publication Date: 2008-02-21
LAIR LIQUIDE SA POUR LETUDE & LEXPLOITATION DES PROCEDES GEORGES CLAUDE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0013]According to the present invention, a stannane gas supply system capable of supplying a stannane gas to an extreme ultraviole...

Problems solved by technology

However, since the stannane is extremely unstable (for example, it is decomposed rapidly in the room temperature) and highly toxic, its handling is extremely difficult.
For these reasons, Japanese Patent Publication No. 60-42203 discloses a method for stabilizing the stannane for stably storing the stannane by pouring the stannane in a container and maintaining the container temperature at −150° C. to −50° C. However, JP 60-42203 has no disclosure on the technique for supplying the stannane filled in the container with a stable flow rate in the gas state.

Method used

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Examples

Experimental program
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Effect test

first embodiment

[0015]FIG. 1 is a schematic chart showing a stannane gas supply system according to a

[0016]A sealed container for storing a mixture of a stannane (monostannane [SnH4]) liquid and a stannane (monostannane [SnH4]) gas, for example, a tank I is stored in a inside housing 2 with its upper side opened. The inside housing 2 is stored in an outside housing 4 having an exhaust pipe 3 in the upper part thereof. The tank 1 is connected with a stannane gas supply line L1 for supplying a stannane gas to an extreme ultraviolet ray radiation source 41. The supply line L1 part disposed outside the outside housing 4 has a low pressure mass flow controller LMSFC capable of controlling the flow rate in a pressure range of 50 to 300 Torr and a switching valve V1 provided from the tank 1 side. The supply line L1 part inside the outside housing 4 between the tank 1 and the low pressure mass flow controller LMSFC is provided with a pressure detecting device 5 for detecting the pressure of the stannane ga...

second embodiment

[0033]In the stannane gas supply system a controlling device 6 is connected with a compressing device 13 of a freezing device 11. The compressing device 13 adjusts the compression degree of the coolant circulating in a circulation line L2 by the control signal from the controlling device 6. According to the compression degree adjustment by the compressing device 13, the stannane cooling operation in a tank 1 at a winding part 12 of the circulation line L2 as an evaporating device can be controlled.

[0034]According to the configuration shown in FIG. 3, while supplying the stannane gas to the extreme ultraviolet ray radiation source 41 and radiating the extreme ultraviolet ray from the radiation source 41, in the case the pressure detection value signal outputted to the controlling device 6 from the pressure detecting device 5 is outside the set pressure (for example 50 to 300 Torr), for example, a detection signal less than the lower limit of the set pressure is outputted from the pr...

third embodiment

[0042]Although the tank 1 for storing a mixture of the stannane liquid and the stannane gas was cooled down by the liquid nitrogen from the liquid nitrogen tank 32 in the third embodiment, a sealed container (for example a tank) storing a low temperature liquefied gas such as a liquid helium, a liquid argon and a liquid carbon dioxide may be used instead of the liquid nitrogen tank for cooling down the stannane in the tank 1 by the low temperature liquefied gas such as a liquid helium, a liquid argon and a liquid carbon dioxide.

[0043]Moreover, although a low pressure mass flow controller having the flow rate controllable pressure range of 50 to 300 Torr was used in the first to third embodiments, a low pressure mass flow controller capable of controlling the flow rate at a pressure lower than this pressure range may be used as well.

[0044]Furthermore, in the first to third embodiments, by branching an exhaust line having a switching valve from the stannane gas supply line L1 part bet...

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Abstract

To provide a stannane gas supply system capable of supplying a stannane gas to an extreme ultraviolet ray radiation source with a stable flow rate. A stannane gas supply system for supplying a stannane gas to an extreme ultraviolet ray radiation source characterized by comprising a sealed container for storing a mixture of a stannane liquid and a stannane gas, connected with the extreme ultraviolet ray radiation source via a pipe, cooling means for cooling the sealed container to a temperature lower than −60° C., a low pressure mass flow controller provided in the pipe, a pressure detecting device mounted in the pipe part disposed between the sealed container and the low pressure mass flow controller, for detecting the pressure of the stannane gas in the pipe part, and controlling means for controlling the cooling degree of the sealed container by the cooling means based on the pressure detection value by the pressure detecting device.

Description

CROSS REFERENCE TO RELATED APPLICATIONS [0001]This application claims the benefit of priority under 35 U.S.C. §119 (a) and (b) to Japanese Application No. JP 2006-222191, filed Aug. 17, 2006, the entire contents of which are incorporated herein by reference.TECHNICAL FIELD [0002]The present invention relates to a stannane gas supply system for supplying a stannane (monostannane [SnH4]) gas to an extreme ultraviolet ray radiation source.BACKGROUND ART [0003]A stannane (monostannane [SnH4]) gas has been attracting attention as a gas component for an extreme ultraviolet ray radiation source of an exposing device which performs lithography by radiating an extreme ultraviolet ray in a process for producing a semiconductor device (see Japanese Patent Application No. 2004-279246). In the application of the stannane gas to such an extreme ultraviolet ray radiation source, in order to stably radiate the extreme ultraviolet ray from the radiation source, it is necessary to supply the stannane...

Claims

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Application Information

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IPC IPC(8): F25B49/00
CPCH05G2/005H05G2/003
Inventor TARUTANI, KOHEI
Owner LAIR LIQUIDE SA POUR LETUDE & LEXPLOITATION DES PROCEDES GEORGES CLAUDE
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