Substrate processing method and substrate processing apparatus

Abstract

The present invention provides a substrate processing method and substrate processing apparatus, which can lighten the damage for the surface of the substrate during cleaning, and can insure sufficient cleaning function. The device comprises: a long shape cleaning brush (221) having a hair bundle composed of many hairs; a removing roller for removing the substrate (B) relative to cleaning brush (221) in the direction crossing with the extending direction of the cleaning brush (221); a support mechanism for supporting the cleaning brush (221) by making the front end (50H) of the cleaning brush hair bundle (50) of the cleaning brush (221) toward the downstream of the moving direction of the substrate (B) of the moving roller and making the flank part (50F) of the cleaning brush hair bundle (50) of the cleaning brush (221) contact with the top surface of the substrate; a processing liquid supply nozzle (231) for supplying processing liquid to the cleaning brush hair bundle (50) of the cleaning brush (221) supported by the support mechanism.

Description

technical field [0001] The present invention relates to various processes, such as cleaning, of glass substrates for LCDs or PDPs, semiconductor substrates, printed substrates, etc., in the manufacturing process of liquid crystal display devices (LCD), plasma display devices (PDP), and semiconductor devices Substrate processing method and substrate processing apparatus. Background technique [0002] In recent years, on substrate manufacturing lines such as glass substrates for LCDs or PDPs, for example, a substrate cleaning mechanism is installed after a specific processing device that uses a chemical solution to perform substrate processing such as etching, and cleans and removes residues on the substrate surface. Films, particles and other foreign matter. For example, as shown in Patent Document 1, as a substrate processing apparatus having such a substrate cleaning mechanism, there has been proposed a device that supplies a processing liquid such as pure water to a subst...

AI Technical Summary

Problems solved by technology

[0006] However, the substrate processing apparatus shown in the above-mentioned Patent Document 1 rotates the roller brush to clean the substrate. etc.), the metal film may be damaged

[0007] In addition, even in the cleaning device shown in Patent Document 2, the cleaning brush is reciprocated in the direction perpendicular to the substrate conveyance direction while in contact with the substrate surface. When the surface of the substrate is exposed, it may cause damage to the metal film

Images