Substrate processing method and substrate processing apparatus

Abstract

The present invention provides a substrate processing method and substrate processing apparatus, it is possible to reduce the damage caused by the substrate surface during cleaning, while being able to secure sufficient cleaning function. The apparatus comprising: elongate cleaning brush (221) having a tuft from the plurality of bristles; a transport roller, which is in the direction of the washing brush (221) extending in a direction intersecting, relatively washing brush (221) the transport substrate (B); a support means that the cleaning brush (221) of the distal cleaning bristle bundles (50) (50H) toward the transfer substrate (B) feed roller conveyance downstream side, and the cleaning brush (221) of the cleaning bristle (50) of the side surface portions beam (50F) contacts the upper surface state of the substrate, so as to support the cleaning brush (221); processing liquid supply nozzle (231), which for by the support mechanism supporting washing brushes (221) cleaning bristle bundles (50) supplying the processing liquid.

Description

technical field [0001] The present invention relates to various processes, such as cleaning, of glass substrates for LCDs or PDPs, semiconductor substrates, printed substrates, etc., in the manufacturing process of liquid crystal display devices (LCD), plasma display devices (PDP), and semiconductor devices Substrate processing method and substrate processing apparatus. Background technique [0002] In recent years, on substrate manufacturing lines such as glass substrates for LCDs or PDPs, for example, a substrate cleaning mechanism is installed after a specific processing device that uses a chemical solution to perform substrate processing such as etching, and cleans and removes residues on the substrate surface. Films, particles and other foreign matter. For example, as shown in Patent Document 1, as a substrate processing apparatus having such a substrate cleaning mechanism, there has been proposed a device that supplies a processing liquid such as pure water to a subst...

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Problems solved by technology

[0006] However, the substrate processing apparatus shown in the above-mentioned Patent Document 1 rotates the roller brush to clean the substrate. etc.), the metal film may be damaged

[0007] In addition, even in the cleaning device shown in Patent Document 2, the cleaning brush is reciprocated in the direction perpendicular to the substrate conveyance direction while in contact with the substrate surface. When the surface of the substrate is exposed, it may cause damage to the metal film

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