Lithographic apparatus and device manufacturing method

A lithographic projection and liquid confinement technology, which is applied in semiconductor/solid-state device manufacturing, photolithography exposure equipment, microlithography exposure equipment, etc., can solve unexpected and unpredictable problems

Inactive Publication Date: 2006-11-08
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This requires additional or more powerful motors, and turbulence in the liquid can lead to undesired and unpredictable results

Method used

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  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method

Examples

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Embodiment Construction

[0021] figure 1 A lithographic apparatus according to an embodiment of the present invention is schematically represented. The unit includes:

[0022] an illumination system (illuminator) IL configured to condition a radiation beam B (eg UV radiation or DUV radiation);

[0023] a support structure (e.g. a mask table) MT configured to support a patterning device (e.g. a mask) MA and connected to a first positioning device PM configured to precisely position the patterning device according to certain parameters;

[0024] a substrate table (e.g. wafer table) WT configured to hold a substrate (e.g. a resist-coated wafer) W and connected to a second positioner PW configured to precisely position the substrate according to certain parameters; and

[0025] A projection system (eg a refractive projection lens system) PS configured to project the pattern imparted to the radiation beam B by the patterning device MA onto a target portion C of the substrate W (eg comprising one or more ...

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PUM

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Abstract

A lithographic projection apparatus uses a volume of a second liquid to confine a first liquid to a space between the projection system and the substrate. In an embodiment, the first and second liquids are substantially immiscible and may be a cycloalkane, such as cyclooctane, decalin, bicyclohexyl, exo-tetrahydro-dicyclopentadiene and cyclohexane, another high-index hydrocarbon, a perfluoropolyether, such as perfluoro-N-methylmorpholine and perfluoro E2, a perfluoroalkane, such as perfluorohexane, or a hydrofluoroether; and water, respectively.

Description

technical field [0001] The invention relates to a photolithography device and a device manufacturing method. Background technique [0002] A lithographic apparatus is an apparatus for applying a desired pattern on a substrate, usually a target portion of the substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, the patterning device may be referred to either as a mask or a reticle, and it may be used to create a circuit pattern formed on an individual layer of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) of a substrate (eg, a silicon wafer). Typically this pattern is transferred by imaging onto a layer of radiation sensitive material (resist) applied to the substrate. Generally, a single substrate will contain a grid of adjacent target portions patterned in succession. Known lithographic apparatuses include so-called steppers, which irradiat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20H01L21/027
CPCG03F7/70341G03F7/2041G03F7/7095
Inventor A·斯特拉伊贾
Owner ASML NETHERLANDS BV
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