Migration-proof light-emitting semiconductor device and method of fabrication
A technology for light-emitting components and semiconductors, which is applied to semiconductor devices, electrical components, and electric solid-state devices, etc., can solve the problem that light-emitting semiconductor regions do not effectively utilize light extraction, and achieve the effects of preventing short circuits and suppressing leakage currents.
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Embodiment 1
[0042] figure 1The light-emitting diode shown as the semiconductor light-emitting element of Embodiment 1 of the present invention is generally composed of the following parts: a conductive support substrate 1, a light reflection layer 2 made of a conductor layer, and a semiconductor region 3 with a light-emitting function. , the first electrode 4 , the second electrode 5 , the protective layer 6 , the mount 7 , the lead member 8 , the wire 9 and the resin enclosure 10 . In order to form a light-emitting diode with a double heterojunction structure, the semiconductor region 3 includes an n-type semiconductor layer 11 generally called an n-type cladding layer, an active layer 12, a p-type semiconductor layer 13 generally called a p-type cladding layer, and a p-type auxiliary layer. semiconductor layer 14 . The semiconductor region 3 will be described in detail later.
[0043] The support substrate 1 is composed of a conductive silicon semiconductor including one main surface ...
Embodiment 2
[0109] Below, explain Figure 8 The semiconductor light-emitting element of Example 2 is shown. but, Figure 8 and represent Examples 3 to 8 described later Figure 9 to Figure 14 basically with figure 1 The same symbols are used for the same parts, and descriptions thereof are omitted. and also, Figure 8 ~ Figure 14 The semiconductor light-emitting element shown is also provided with figure 1 The mounting seat 24, the lead terminal 8, the wire 9 and the same part of the enclosure 10, but in order to simplify Figure 8 ~ Figure 14 The illustration is omitted.
[0110] Figure 8 In the semiconductor light-emitting element of Example 2 except the deformed protective layer 6a and figure 1 same. Figure 8 The protective layer 6a is formed by making the exposed surface of the light reflection layer 2 and the exposed side surface of the semiconductor region 3 high-resistance, that is, insulated. This insulating protection layer 6 a can be formed by implanting ions into th...
Embodiment 3
[0113] Figure 9 The semiconductor light-emitting element of Example 3 shown is in addition to the deformed protective layer 6b and the current blocking layer 31 and figure 1 The same constitutes.
[0114] Figure 9 The protective layer 6b consists of the first protective layer 6b covering the side 22 of the light reflection layer 2 1 and cover the first protective layer 6b 1 The second protective layer 6b on 2 constitute. First protective layer 6b 1 and Figure 8 The protective layer 6a is also formed by ion implantation. Second protective layer 6b 2 and figure 1 The protective layer 6 is also formed by coating an insulating inorganic substance, except for covering the first protective layer 6b 1 In addition, the side surface 23 of the semiconductor region 3 , the other main surface 18 and part of the side surface of the substrate 1 are also covered. Figure 9 The side surface 22 of the light reflection layer 2 is covered by the first and second protective layers 6...
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