Measuring structure and method for micro-electronic mechanical system multi-layer membrane stress and yang's modulus
A technology of microelectronic machinery and Young's modulus, which is applied in the direction of measuring devices, material analysis by electromagnetic means, instruments, etc., can solve the problem of complex test structure and processing technology, and the difficulty of simultaneously measuring stress and Young's modulus for multi-layer film structures. Quantity, not suitable for online testing and other issues
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0042] Below in conjunction with accompanying drawing, the specific structure of the embodiment of the present invention is further described with the example of preparing two-layer tested membrane structure support beam:
[0043] In this embodiment, the first layer of tested film material 101 is a polysilicon film, and the second layer of tested film material 102 is an aluminum film. To measure the stress and Young's modulus of the two layers of polysilicon film and aluminum film, at least two test structures with different lengths, that is, beam 1, need to be fabricated. Different forms, one of which is that the width of each layer of the material to be tested is equal, and the other is that the width of each layer of the material to be tested is unequal.
[0044] The preparation method of the tested support beam 1 structure is:
[0045] Prepare a silicon substrate 401, oxidize a layer of film 402 on the substrate, deposit a layer of insulating film 403,
[0046] Deposit a...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
width | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com