Multiple electrode array and manufacturing method

Abstract

A multi-electrode array is composed of a pinhole array, multiple right-angle electrodes made of metal wire and arranged in the vertical pinholes of pinhole array, and fixing resin on the top surface of pinhole array for fixing the horizontal parts of said electrodes.

Description

technical field [0001] The invention relates to multi-electrode array technology, in particular to a multi-electrode array manufacturing method. Background technique [0002] The multi-electrode array is formed by integrating multiple micro-electrodes on one substrate and implanted in the cerebral cortex, which can read the detailed information of the neuron group activity in the brain. In terms of basic neuroscience research, multi-electrode arrays have begun to become an important means of neural information detection. In terms of medical applications, multi-electrode arrays have become an interface for neuroscience-oriented medical applications. [0003] In 1981, American scientist Kruger et al. used ceramic materials to fix multiple microelectrodes on a grid with a spacing of 250 microns to form a multi-electrode array. This method is inefficient, and the length and parallelism of the electrodes are not easy to control. Afterwards, various improved multi-electrode array...

AI Technical Summary

Problems solved by technology

[0003] In 1981, American scientist Kruger et al. used ceramic materials to fix multiple microelectrodes on a grid with a spacing of 250 microns to form a multi-electrode array. This method is inefficient, and the length and parallelism of electrodes are not easy to control.

Afterwards, various improved multi-electrode array manufacturing methods appeared. For example, the electrode array of Utah University uses a dicing knife to directly carve a plurality of electrode tips on a silicon substrate, and then makes finished products through processes such as insulation and wire bonding. The problem with the method is that the size of the electrode tip cannot be made too thin, and the electrode that is too thick will cause great damage to the brain tissue, and it is also difficult to manufacture a high-density multi-electrode array

In addition, there are planar integrated circuit manufacturing processes such as photolithography and ion sputtering to make sheet-like multi-electrodes, and then laminated to form a multi-electrode array, such as the electrode array of the University of Michigan in the United States, but this type of electrode array is in terms of comprehensive performance. Still needs to be improved, and it has not yet been commercialized

Images