Technique for plating film of uncrystallized diamond

An amorphous diamond and process technology, applied in metal material coating process, gaseous chemical plating, coating and other directions, can solve the problems of difficult to seal gas ion source, high cost of coating equipment, low coating productivity, etc., to shorten the bombardment Time, avoid the effects of uneven bombardment and high failure rate

Inactive Publication Date: 2006-06-28
陕西百纳科技发展有限责任公司
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Problems solved by technology

[0010] The invention solves the problem of difficult sealing of the gas ion source, many faults, uneven bombardment, small bombardment area, low coating productivity and high cost of coating equipment existing in the vacuum coating technology in the background technology when the surface of the plated piece is bombarded with argon ions before coating. technical problem

Method used

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Embodiment Construction

[0030] Process flow of the present invention is as follows:

[0031] 1) Clean the surface of the parts;

[0032] 2) Put the parts into the vacuum chamber of the coating machine, and evacuate to 1*10 -2 Pa~1*10 -5 Pa;

[0033] 3) Use a solid ion source to bombard the surface of the coating with carbon ions;

[0034] 4) Ion beam accelerated bias power conversion (from high voltage power to low voltage power);

[0035] 5) Coating amorphous diamond film to meet the required film thickness;

[0036] 6), deflate;

[0037] 7) Take out the parts package.

[0038] The technical parameters of carbon ion bombardment in step 3) are: bombardment voltage: 1000V-15000V; bombardment time: 3 minutes-30 minutes; arc current: 20A-90A.

[0039] Take the austenitic stainless steel coated with amorphous diamond film as an example (the thickness of the amorphous diamond film is the same):

[0040] The parameters for argon ion bombardment are: bombardment voltage 1000V; bombardment time 30 mi...

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Abstract

A technology for plating non-crystal diamond film on the surface of workpiece includes cleaning the surface of workpiece, fixing it in vacuum chamber of film-plating machine, vacuumizing, using carbon ions of solid ion source to bomboard said surface, switching the accelerating bias of ion beam from high voltage to low voltage, plating non-crystal diamond film, and filling gas. Its advantages are high productivity and quality.

Description

1. Technical field [0001] The invention relates to a process for plating an amorphous diamond film, in particular to a pre-plating treatment method for plating an amorphous diamond film by bombarding with carbon ions. 2. Background technology [0002] In the previous vacuum coating process, in the vacuum chamber, inert gas ions or atoms such as argon and helium are generally used to bombard the surface of the substrate before coating to remove surface dirt, oxidation passivation film and surface adsorbed gas, water vapor, etc., and activate Surface, in order to improve the bonding force between the coating and the substrate. Therefore, bombarding the surface of the plated parts with argon ions before plating is the surface cleaning and activation technology commonly used in the current vacuum coating process technology. However, with argon ion bombardment, the coating equipment must be equipped with argon gas ion source and related control power supply. This coating technol...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/27C23C16/02
Inventor 黎永钧张源斌
Owner 陕西百纳科技发展有限责任公司
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