Technique for plating film of uncrystallized diamond
An amorphous diamond and process technology, applied in metal material coating process, gaseous chemical plating, coating and other directions, can solve the problems of difficult to seal gas ion source, high cost of coating equipment, low coating productivity, etc., to shorten the bombardment Time, avoid the effects of uneven bombardment and high failure rate
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[0030] Process flow of the present invention is as follows:
[0031] 1) Clean the surface of the parts;
[0032] 2) Put the parts into the vacuum chamber of the coating machine, and evacuate to 1*10 -2 Pa~1*10 -5 Pa;
[0033] 3) Use a solid ion source to bombard the surface of the coating with carbon ions;
[0034] 4) Ion beam accelerated bias power conversion (from high voltage power to low voltage power);
[0035] 5) Coating amorphous diamond film to meet the required film thickness;
[0036] 6), deflate;
[0037] 7) Take out the parts package.
[0038] The technical parameters of carbon ion bombardment in step 3) are: bombardment voltage: 1000V-15000V; bombardment time: 3 minutes-30 minutes; arc current: 20A-90A.
[0039] Take the austenitic stainless steel coated with amorphous diamond film as an example (the thickness of the amorphous diamond film is the same):
[0040] The parameters for argon ion bombardment are: bombardment voltage 1000V; bombardment time 30 mi...
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