Treatment method of silicon powder for molten silicon infiltration
A processing method and technology of silicon powder, applied in the field of inorganic materials, can solve the problems of reducing the pore size, reducing the permeability of porous bodies, uneven penetration, etc., and achieving the effect of avoiding the blocking of pores by reaction
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Embodiment 1
[0022] Adopt technical scheme of the present invention to process the step of silicon powder for fused siliconizing as follows:
[0023] Step 1. Place 500 grams of 10-micron silicon powder in the deposition furnace tooling, use propylene as the carbon source, and deposit a thin layer of cracked carbon on the surface of the silicon powder. The deposition temperature is 950°C and the deposition time is 30 minutes;
[0024] Step 2. Put the carbon-coated silicon powder prepared above into a high-temperature furnace for shelling treatment at a temperature of 1400° C. for 10 minutes to prepare silicon powder containing a silicon carbide shell. The silica powder can be broken at 1600°C to achieve rapid densification of the porous body.
Embodiment 2
[0026] Adopt technical scheme of the present invention to process the step of silicon powder for fused siliconizing as follows:
[0027] Put 500 grams of 10-micron silicon powder in a high-temperature furnace, feed nitrogen gas for high-temperature nitriding treatment, the temperature is 1420°C, and the treatment time is 10 minutes, so that a layer of silicon nitride shell is formed on the surface of the silicon powder. Cracking occurs at 1550°C, realizing rapid densification of the porous body.
Embodiment 3
[0029] Adopt technical scheme of the present invention to process the step of silicon powder for fused siliconizing as follows:
[0030] Step 1. Dissolve 20 grams of phenolic resin in 300 grams of ethanol, then add 500 grams of 10-micron silicon powder into the above solution, and ball mill for 5 hours. Put the above mixture on the release paper and dry it for 5 hours, the drying temperature is 80°C;
[0031] Step 2. Put the dried mixture in a high-temperature furnace for cracking. The cracking temperature is 1000°C for 60 minutes, and then continue to raise the temperature to 1400°C for 10 minutes to prepare a shell containing silicon carbide. of silica fume. The silica powder can be broken at 1600°C to achieve rapid densification of the porous body.
[0032] Using the silicon powder treated in Example 2 to prepare reaction sintered silicon carbide, the porous body is porous carbon formed by resin cracking, the infiltration temperature is 1550°C, the infiltration time is 30...
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