Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Apparatus and method for maintaining high performance plasma

A technology of plasma and high-energy ions, which is applied in the direction of plasma, climate sustainability, nuclear power generation, etc., can solve problems such as instability, boundary local mode instability, and limited technical parameter intervals, so as to reduce recirculation, Avoid the effects of turbulence and energy diffusion

Active Publication Date: 2021-10-22
ENN SCI & TECH DEV
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Although the spherical tokamak shows better MHD stability than the conventional tokamak, there are still various instabilities, such as the neoclassical tearing membrane (Neoclassical Tearing Mode or NTM) commonly found in tokamak devices, Instability Boundary Localized Modes (ELMs) Instability etc.
[0006] MHD instabilities limit the highest plasma parameters achievable for plasmas in tokamaks
For example, the maximum plasma circumferential current, the highest plasma pressure gradient and specific pressure, and the highest plasma density are limited, which in turn limits the technical parameter range of the tokamak plasma operation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Apparatus and method for maintaining high performance plasma
  • Apparatus and method for maintaining high performance plasma
  • Apparatus and method for maintaining high performance plasma

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0069] In order to make the purpose, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions of the embodiments of the present application will be clearly and completely described below in conjunction with the drawings of the embodiments of the present application. Apparently, the described embodiments are some of the embodiments of the present application, but not all of them. Based on the described embodiments of the present application, all other embodiments obtained by persons of ordinary skill in the art without creative efforts shall fall within the protection scope of the present application.

[0070] Unless otherwise defined, the technical terms or scientific terms used in the application shall have the ordinary meanings understood by those skilled in the art to which the application belongs. "First", "second" and similar words used in this application do not indicate any order, quantity or importance, but are o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides a device and a method for maintaining high-performance plasma. The device comprises a central column; a vacuum container, which is arranged around the central column, and the vacuum container is used for containing the formed plasma; a plasma magnetic confinement system, which is used for limiting, forming and controlling the plasma in the vacuum container through a magnetic field, so that the plasma body forms a configuration with a plurality of fluids, wherein the multiple fluids form multiple layers from inside to outside, the fluid located on the outer layer surrounds the fluid located on the inner layer, and the adjacent fluids are at least partially overlapped. In the application, the configuration with a plurality of fluids is formed, wherein the high-energy electron fluid surrounds the thermionic fluid and the thermionic fluid, and the maintenance of the high-energy electron fluid enables the circumferential current to have a very large circumferential current outside the outermost closed magnetic surface, so that plasma turbulence and energy diffusion are effectively avoided; therefore, the recycling phenomenon of particles on the outermost closed magnetic surface is reduced, and the energy constraint capacity and stability of thermionic ions and thermionic electrons in the closed magnetic surface are effectively improved.

Description

technical field [0001] The present application belongs to the technical field of plasma confinement, and in particular relates to a device and method for maintaining high-performance plasma. Background technique [0002] The realization of controlled nuclear fusion may fundamentally solve the energy problem of mankind, so it has attracted extensive attention from many countries. There are two main ways to achieve controlled nuclear fusion, inertial confinement fusion and magnetic confinement fusion. Tokamak, which uses a magnetic field to confine high-temperature plasma, is considered to be the most promising device for achieving controlled nuclear fusion, and has achieved remarkable results in scientific and engineering research. However, the tokamak device itself has some deficiencies related to becoming a high-efficiency fusion core, and the more prominent ones are: a very low annular magnetic specific pressure value β (the ratio of the thermal energy of the plasma to th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G21B1/05
CPCG21B1/057G21B1/05H05H1/12Y02E30/10
Inventor 彭元凯
Owner ENN SCI & TECH DEV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products