Quartz tube cleaning device and cleaning method

Abstract

The invention provides a quartz tube cleaning device and a cleaning method. The quartz tube cleaning device includes a cleaning cover with an open bottom, and a base that is movably plugged and assembled with the cleaning cover along the vertical direction, and is arranged in the base to hold the quartz tube. The bearing platform, and the driving device; the top of the cleaning cover is provided with a first nozzle, the side wall of the cleaning cover is vertically provided with several second nozzles, and the bearing platform is vertically provided with an inner nozzle pipe, and the inner nozzle pipe is located at the top and side above the bearing platform A number of third nozzles are provided; the base is embedded with a rotary sealing device, and the inner nozzle pipe runs through the carrier platform and the rotary sealing device continuously in the vertical direction; the driving device drives the carrier platform to rotate, and the inner nozzle tube remains stationary during the rotation process of the carrier platform. Through the application, efficient cleaning of quartz tubes of various sizes has been realized, which can meet the cleaning needs of quartz tubes with different diameters, simplifies the structure of the quartz tube cleaning device and improves the service life, and avoids the quartz tubes from being damaged during the cleaning process. damage.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment consumable cleaning equipment, in particular to a quartz tube cleaning device and cleaning method. Background technique [0002] Quartz tube is a semiconductor equipment consumable commonly used in semiconductor device manufacturing equipment (such as chemical vapor deposition (CVD), physical vapor deposition (PVD), diffusion equipment (Diff) or film formation equipment (T / F), etc.). After the quartz tube is used in the aforementioned semiconductor equipment for a period of time, a large amount of dirt, metal impurities or solid particles will remain on the inner wall surface. However, the quartz tube is expensive, so it needs to be reused after being thoroughly cleaned to reduce the manufacturing cost of semiconductor devices . [0003] After searching, the applicant found that the Chinese invention patent with publication number CN101181711A discloses an automatic vertical quart...

AI Technical Summary

Problems solved by technology

Therefore, when the tube nozzle at the top sprays deionized water (DIW) or cleaning agent into the opening of the quartz tube, the weight of the entire quartz tube will be huge, which will seriously affect the stability of the quartz tube when it is driven by the turntable and rotates. Sexuality and increase energy consumption, and there is a serious waste of deionized water

In addition, objectively, this cleaning device has a poor cleaning effect on the inner wall of the quartz tube due to the liquid stored in the quartz tube.

Secondly, because the prior art needs to be supported by the workpiece support on the turntable, the outer wall of the quartz tube in contact with the workpiece support is shielded by the workpiece support, resulting in the defect that the outer wall of the quartz tube cannot be effectively cleaned. Moreover, the turntable needs to withstand the huge pressure exerted by the quartz tube and the liquid stored in the quartz tube, which will easily cause the turntable to malfunction and cause damage to the turntable; finally, the applicant also pointed out that this prior art can only be used for one kind of The quartz tube with a specific diameter is cleaned, and the outer wall of the quartz tube will rub against the workpiece holder during the rotation process, which will cause scratches on the outer wall of the quartz tube during the cleaning process, and cannot meet the cleaning needs of quartz tubes with different diameters

Images