Method for preparing ultrathin noble metal film catalyst by heat collection strategy
A precious metal and catalyst technology, applied in the fields of materials science and engineering technology and chemistry, can solve the problems of inability to realize electroplating of insulating materials and high power
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Embodiment 1
[0023] Preparation of ultra-thin platinum nano-film materials at 1-400 °C.
[0024] Prepare material A: Dilute the concentration of chloroplatinic acid solution to 0.1mM / L, take 13.5uL of the above solution and evenly drop it to a size of 1cm 2 A clean and flat silicon wafer, the drop-coated silicon wafer is recorded as material A. The material A is quickly put into a muffle furnace at 400°C for a period of time, and then the reacted sample is quickly taken out to allow it to cool naturally to room temperature, and the ultra-thin platinum nano-film material can be obtained. The reaction atmosphere environment is inert gas or air, and the holding time is 5s, 10s, 15s, 20s, 25s, 30s.
Embodiment 2
[0026] Preparation of ultra-thin platinum nano-film materials at 1-450°C.
[0027] Prepare material A: Dilute the concentration of chloroplatinic acid solution to 0.1mM / L, take 13.5uL of the above solution and evenly drop it to a size of 1cm 2 A clean and flat silicon wafer, the drop-coated silicon wafer is recorded as material A. The material A is quickly put into a muffle furnace at 450°C for a period of time, and then the reacted sample is quickly taken out, and after it is naturally cooled to room temperature, an ultra-thin platinum nano-film material can be obtained. The reaction atmosphere environment is inert gas or air, and the holding time is 5s, 10s, 15s, 20s, 25s, 30s.
Embodiment 3
[0029] Preparation of ultra-thin platinum nano-film materials at 1-500 °C.
[0030] Prepare material A: Dilute the concentration of chloroplatinic acid solution to 0.1mM / L, take 13.5uL of the above solution and evenly drop it to a size of 1cm 2 A clean and flat silicon wafer, the drop-coated silicon wafer is recorded as material A. The material A is quickly put into a muffle furnace at 500°C for a period of time, and then the reacted sample is quickly taken out to allow it to cool naturally to room temperature, and the ultra-thin platinum nano-film material can be obtained. The reaction atmosphere environment is inert gas or air, and the holding time is 5s, 10s, 15s, 20s, 25s, 30s.
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