Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A surface-enhanced Raman scattering substrate and its preparation method and application

A surface-enhanced Raman and substrate technology, used in Raman scattering, material excitation analysis, instruments, etc., can solve the problems of difficult to obtain the deposition layer of nano-silver particles, high cost of SERS substrate preparation, and inability to use SERS detection. Excellent performance, high sensitivity, low cost effect

Active Publication Date: 2021-08-10
BEIJING CENT FOR DISEASE PREVENTION & CONTROL
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The main reasons that restrict the development of this technology to practical application are that the preparation cost of this SERS substrate is high, the technical operation is difficult, and it is difficult to obtain a deposition layer that can form uniform and dense nano-silver particles in a large area.
[0005] In addition, although SERS technology has the advantages of low cost, high sensitivity, and rapid analysis time, it cannot be detected by SERS for substances with weak SERS signals, and substances with small Raman scattering cross-sections or even no Raman vibrations.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A surface-enhanced Raman scattering substrate and its preparation method and application
  • A surface-enhanced Raman scattering substrate and its preparation method and application
  • A surface-enhanced Raman scattering substrate and its preparation method and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0066] Preparation of surface-enhanced Raman scattering substrate:

[0067] S1. NAAO@TA / Fe 3+ Preparation of the NAAO film: Soak the NAAO film in an aqueous solution of tannic acid at pH=7 for 1 hour, take it out, wash off the excess tannic acid on the surface with ultrapure water, and obtain NAAO@TA, and place the NAAO@TA in a 0.001mol / L FeCl 3 Incubate in an aqueous solution, take it out after 1 min, and soak it again in an aqueous solution of tannic acid at pH=7, so that Fe 3+ Complexation with tannic acid to obtain NAAO@TA / Fe 3+ ;

[0068] S2. Preparation of silver ammonia solution: 0.17gAgNO 3 Dissolve in 9.7mL water, add 0.3mL ammonia solution dropwise to obtain 0.1mol / L transparent silver ammonia solution;

[0069] S3. Preparation of surface-enhanced Raman scattering substrate: the NAAO@TA / Fe 3+ Soaked in 2mL 0.1mol / L silver ammonia solution, deposited in situ at 60°C for 4h to form NAAO@AgNS1.

Embodiment 2

[0071] Preparation of surface-enhanced Raman scattering substrate:

[0072] S1. NAAO@TA / Fe 3+ Preparation of the NAAO film: Soak the NAAO film in an aqueous solution of tannic acid at pH=7 for 1 hour, take it out, wash off the excess tannic acid on the surface with ultrapure water, and obtain NAAO@TA, and place the NAAO@TA in a 0.001mol / L FeCl 3 Incubate in an aqueous solution, take it out after 1 min, and soak it again in an aqueous solution of tannic acid at pH=7, so that Fe 3+ Complexation with tannic acid to obtain NAAO@TA / Fe 3+ ;

[0073] S2. Preparation of silver ammonia solution: 0.17gAgNO 3 Dissolve in 9.7mL water, add 0.3mL ammonia solution dropwise to obtain 0.1mol / L transparent silver ammonia solution;

[0074] S3. Preparation of silver growth medium: add 1mL 5mmol / L silver ammonia solution, 0.5mL 50mmol / L ascorbic acid, 0.5mL 1% (w / v) sodium citrate aqueous solution into 12.5mL water, mix well to obtain silver growth medium ;

[0075] S4. Preparation of surf...

Embodiment 3

[0089] Example 3 Surface-enhanced Raman scattering substrate NAAO@AgNS2 for testing fluoroacetic acid

[0090] S1. After incubating the surface-enhanced Raman scattering substrate NAAO@AgNS2 prepared in Example 2 with 0.001mol / L KSCN aqueous solution for 30min, the SCN - As internal standard, take it out, wash with pure water, and carry out quantitative determination;

[0091]S2. Add 0.01μmol / L-0.6μmol / L standard solution of fluoroacetic acid and 0.6μmol / L thiosalicylic acid into 0.2mL buffer solution containing 1.0mmol / L NaOH and 1.0mmol / L KI, at 90℃ After reacting for 30 minutes, the solution was transferred to a circular quartz measurement cell with a surface-enhanced Raman scattering substrate NAAO@AgNS2. After incubation for 1 hour, a random area on the surface-enhanced Raman scattering substrate film was selected under a microscope, and it was found that the There is basically no change in the Mann intensity, indicating that the substrate has a large area of ​​uniform...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
particle diameteraaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

The invention provides a surface-enhanced Raman scattering substrate and its preparation method and application, which belong to the technical field of surface-enhanced Raman scattering thin films. The surface-enhanced Raman scattering substrate includes a substrate and a three-dimensional noble metal nanostructure; the substrate It is a NAAO thin film, and the noble metal is Ag; the preparation method is as follows: make Fe on the surface of the NAAO thin film 3+ Complexation with tannic acid (TA) to obtain NAAO@TA / Fe 3+ , and further deposited in situ in a silver-containing solution to form a surface-enhanced Raman scattering substrate. The invention adopts a step-by-step assembly method, and uses a metal polyphenol coordination polymerization network to coat the NAAO film, and the TA / Fe on the surface 3+ The complex deposited large-area uniform silver nanostructures (AgNS) in situ on the NAAO substrate to prepare a surface-enhanced Raman scattering substrate, which has the advantages of uniformity, large area, and high sensitivity, and can realize on-site detection of trace amounts of fluoroacetic acid.

Description

technical field [0001] The invention relates to the technical field of surface-enhanced Raman scattering detection, in particular to a surface-enhanced Raman scattering substrate and a preparation method and application thereof. Background technique [0002] Fluoroacetic acid is a prohibited highly toxic rodenticide, which is widely used in agriculture. Because of its high acute toxicity and good chemical stability, it has caused many serious food poisoning incidents. Among them, the most famous one is the 2009 incident of Fonterra Group's commercial milk supply contaminated by fluoroacetic acid, which caused a huge panic and caused serious economic losses at that time. Although fluoroacetic acid has been banned and strictly regulated, it can still be used illegally for deliberate physical assault and terrorist activities. As a food precautionary measure, developing a rapid, low-cost, and convenient method for the detection of fluoroacetic acid in food and biological sample...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/65
CPCG01N21/658
Inventor 孙洁芳邵兵张晶
Owner BEIJING CENT FOR DISEASE PREVENTION & CONTROL
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com