Process method for optimizing uniformity on pyramid suede

Abstract

The invention discloses a process method for optimizing uniformity on a pyramid suede, and the method comprises the following steps: S1, providing an original silicon wafer of a solar cell, carrying out the texturing of the original silicon wafer, growing the pyramid suede, and carrying out the cleaning pretreatment of the suede; S2, performing diffusion process treatment on the silicon wafer; S3, polishing the surface of the silicon wafer; and S4, depositing an aluminum oxide film on the surface of the silicon wafer in a two-way alternating airflow mode. The aluminum oxide film is grown in a two-way alternate air inlet mode, the uniformity of the aluminum oxide film can be greatly improved, the uniformity of the aluminum oxide film under a pyramid suede structure can also be controlled within 3%, the higher field passivation effect of the aluminum oxide film can be exerted, Auger recombination, SRH recombination and surface recombination are reduced, and the passivation effect is greatly improved.

Description

technical field [0001] The invention relates to the technical field of photovoltaic solar cells, in particular to a process method for optimizing uniformity on a pyramid textured surface applied to the surface deposition of photovoltaic solar cells. Background technique [0002] A photovoltaic solar cell is a semiconductor material that converts the sun's light energy directly into electrical energy. Silicon photovoltaic cells based on silicon are commonly used at present, including monocrystalline silicon, polycrystalline silicon, amorphous silicon, crystalline silicon and compound laminated photovoltaic cells, etc. PERT battery (Passivated Emitter and Rear Totally-diffused Cell, passivated emitter rear fully diffused cell), PERC battery (Passivated Emitter and Rear Cell, emitter and rear passivation technology) are new photovoltaic cell technologies, PERT and PERC The biggest difference between the battery and conventional batteries is that the dielectric film on the fron...

AI Technical Summary

Problems solved by technology

[0004] Aiming at the defects such as the poor uniformity of the aluminum oxide film on the pyramid textured surface structure existing in the air intake mode of the above-mentioned existing ALD passivation equipment, the applicant provides a process method for optimizing the uniformity of the pyramid textured surface, through two-way alternate air intake The method improves the uniformity of the aluminum oxide film layer, maximizes the effect of aluminum oxide passivation on the surface of the silicon wafer with suspended unsaturated bonds, and solves the problems of pores, field-free passivation, and high power consumption caused by uneven aluminum oxide films. Energy, EL black spots, EL black spots and other problems, and can be used for double-sided passivation of silicon wafers

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