High-flux super-resolution focal spot generation device based on optical fibers

Abstract

The invention discloses a high-flux super-resolution focal spot generation device based on optical fibers. The high-flux super-resolution focal spot generation device firstly generates a suppression light beam array, and each path of laser is coupled to a vortex optical fiber, so that a light beam carrying a vortex phase can be formed, and the device cost and the system space can be reduced; thenspecific intensity modulation is carried out through a multi-channel acoustic modulator to generate high-flux dark spots; meanwhile, an exciting light beam array is coupled into an exciting path optical fiber array, and then specific intensity modulation is carried out through a multi-channel acoustic optical modulator to generate solid light spots; and finally, the two light beam arrays are combined, two overlapped light spot arrays are formed through focusing of an objective lens, and a super-resolution focal spot array is formed through the inhibition effect of the dark spots on the actionrange of the solid light spots. According to the high-flux super-resolution focal spot generation device, independent regulation and control of the dark spots can be realized to realize high-flux laser direct writing processing and parallel super-resolution microscopic imaging, and the processing speed and the imaging speed are effectively improved; and no extra modulation device is needed, and the system structure is compact.

Description

technical field [0001] The invention belongs to the field of optical engineering, in particular to an optical fiber-based high-throughput super-resolution focal spot generation device. Background technique [0002] In recent years, femtosecond laser direct writing micro-nano processing technology has achieved rapid development and diversified applications in multiple fields, and achieved a series of related achievements. As a nonlinear optical processing technology, it has many significant advantages compared with traditional photolithography technology: 1. High resolution and low thermal damage. 2. True 3D, easy integrated processing, high designability and controllability. 3. Wide range of materials and low processing environment requirements. Except for special circumstances, femtosecond laser direct writing processing can be realized under common environmental conditions such as atmosphere, solvent, and aqueous solution, and does not require special processing environm...

AI Technical Summary

Problems solved by technology

[0004] However, the current development of this technology has only achieved a huge breakthrough in resolution, and its system and technical solutions still belong to the category of low-throughput processing.

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