Special-shaped glass mask production method

A production method and technology of special-shaped glass, applied in the field of photolithography, can solve the problem that a photolithography machine cannot make a mask plate of hetero-shaped glass, etc.

Pending Publication Date: 2020-10-27
深圳清溢光电股份有限公司
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  • Abstract
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Problems solved by technology

[0005] The technical problem mainly solved by the embodiments of the present invention is to provide a method for producing a sp...

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  • Special-shaped glass mask production method

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Embodiment Construction

[0025] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0026] Unless otherwise defined, all technical and scientific terms used in this specification have the same meaning as commonly understood by one of ordinary skill in the technical field of the invention. The terminology used in the description of the present invention in this specification is only for the purpose of describing specific embodiments, and is not used to limit the present invention. The term "and / or" used in this specification includes any and all combinations of one or more of the associated listed items.

[0027] In addition, the technical features involved in the various embodi...

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Abstract

The embodiment of the invention relates to the technical field of photoetching, and discloses a special-shaped glass mask production method. The method comprises the steps of receiving a mask patternto be produced, and processing the mask pattern to be produced through a CAM system; performing conventional process treatment on the glass mask according to a treatment result of the CAM system; carrying out special shape process treatment on the glass mask subjected to the conventional process treatment; and carrying out packaging and delivery after the production of the special-shaped glass mask is completed. According to the special-shaped glass mask plate production method provided by the embodiment of the invention, special-shaped glass mask plate production is realized, and particularlythrough mask protection before special shape treatment and cleaning after special shape treatment, the function of the mask is not damaged in the treatment process.

Description

technical field [0001] The embodiments of the present invention relate to the technical field of photolithography, and in particular to a method for producing a special-shaped glass mask. Background technique [0002] Optical mask (hereinafter referred to as mask or glass mask) is a structure in which various functional patterns are made on film, plastic or glass substrate materials and precisely positioned for selective exposure of photoresist coatings . Masks are widely used, and masks are required in fields involving photolithography, such as IC (Integrated Circuit, integrated circuit), FPD (Flat Panel Display, flat panel display), PCB (Printed Circuit Boards, printed circuit boards) ), MEMS (Micro Electro Mechanical Systems, Micro Electro Mechanical Systems), etc. [0003] The platform working characteristics of the mask lithography machine have requirements for the thickness, flatness, chamfering and chamfering of the mask plate substrate. The working principle of the...

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Application Information

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IPC IPC(8): G03F1/82G03F1/68
CPCG03F1/82G03F1/68
Inventor 荆学军熊启龙
Owner 深圳清溢光电股份有限公司
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