Laser wavelength measuring device and method

Abstract

The invention discloses a laser wavelength measuring device and method. The laser wavelength measuring device comprises a first light path assembly and a second light path assembly; the second light path assembly and the first light path assembly form a laser wavelength measurement light path; the second light path assembly comprises an FP etalon assembly and an optical grader, wherein the homogenized laser beams pass through the FP etalon assembly to generate interference fringes; the optical grader is arranged behind the FP etalon assembly in the laser wavelength measurement light path and is used for deflecting the laser beams passing through the FP etalon assembly. According to the FP etalon assembly, the two FP etalons share the same optical path for interference imaging; the structure is compact, the size is small, the design is simple, and the stability is high; under the cooperation of the optical grader, the laser wavelength can be accurately measured at the same time, the wavelength measurement range is large, and the device is suitable for online measurement of the laser wavelength and corresponding closed-loop control feedback.

Description

technical field [0001] The invention relates to the technical field of laser spectrum measurement, in particular to a laser wavelength measurement device and method. Background technique [0002] Laser is an important light source equipment in modern industry. It can be used in lighting, laser processing, projection display, optical communication, material analysis, test measurement, semiconductor processing and other fields. ), requiring the laser to have high wavelength stability. Therefore, it is required to design a corresponding laser wavelength measurement device on the laser, and realize closed-loop feedback on the wavelength of the laser according to the measurement results, so as to ensure the stable wavelength output of the laser. [0003] In the field of semiconductor processing technology, the excimer laser is the main light source used in the semiconductor photolithography process. For example, the central wavelength of the ArF excimer laser is 193.4nm, and th...

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Problems solved by technology

[0014] In order to solve the technical problems that the laser wavelength measurement device in the prior art cannot achieve a complete common optical path, the device is relatively complicated, and the wavelength measurement result is easily affected by the outside world, resulting in relatively poor wavelength measurement accuracy and stability, the invention discloses a laser wavelength measurement device. Measuring device and method

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