A rotary drum reactor for pulse chemical vapor deposition coating and its application

Abstract

The invention discloses a drum type reactor for pulse chemical vapor deposition coating and application thereof. The reactor includes a precursor supply part, a reaction part, and an exhaust gas treatment part; the precursor supply part includes a first gas supply part and a second gas supply part, and the first gas supply part includes a source bottle with a heating device; the second gas supply part It is connected to the air and sucked in by the negative pressure of the reaction part; the reaction part includes the reaction drum and the driving device for driving the reaction drum, and the reaction drum is placed horizontally on the driving device; the tail gas treatment part is used for vacuuming the reaction drum and absorbing reaction after the exhaust. Reactor among the present invention is mainly used for anatase TiO 2 For pulse chemical vapor deposition coating, the reactor with this structure can improve the gas-solid phase contact conditions, solve the problem of slow reaction caused by difficult gas diffusion, speed up the reaction rate of gas phase coating, and simplify the operating conditions, avoiding the Uneven thickness, raw material loss, dust pollution and other effects in the tiling process.

Description

technical field [0001] The invention belongs to the technical field of reactors, and in particular relates to a rotary drum reactor for pulse chemical vapor deposition coating and its application. Background technique [0002] TiO 2 As a white pigment, it has important applications in the fields of coatings, plastics and papermaking, but TiO 2 The photocatalytic performance will promote the oxidative decomposition of organic matter, causing the paint to fade, surface roughness and powdering. in TiO 2 Depositing an inert film layer on the surface of the particles can inhibit its photocatalytic performance and maintain its excellent pigment performance. [0003] in TiO 2 In the field of coating, there are liquid-phase synthesis method and gas-phase synthesis method, and the liquid-phase synthesis method has achieved industrial application. However, the liquid phase synthesis method is difficult to precisely control the film layer, and the film layer is porous, and it need...

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Problems solved by technology

[0005] In view of the above problems, the present invention provides a drum reactor for pulse chemical vapor deposition coating, the reactor in the present invention is conducive to scale-up and industrial application, can improve gas-solid phase contact conditions, and solve the problem caused by gas diffusion The problem of slow reaction caused by it can speed up the gas phase coating reaction rate, and can simplify the operating conditions, avoiding the influence of uneven thickness, raw material loss, dust pollution, etc. in the process of laying raw materials

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