Formula of monocrystalline silicon texturing additive containing polyol and PEG

A technology of additives and polyols, applied in the directions of single crystal growth, single crystal growth, polycrystalline material growth, etc., can solve the problems of poor surface uniformity of silicon wafers, poor texture stability, and unsatisfactory texture effects, etc., to achieve Improved texturing effect, improved photoelectric conversion efficiency, and excellent texturing effect

Inactive Publication Date: 2020-02-28
HUNAN INSTITUTE OF SCIENCE AND TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The texturing effect of this kind of texturing liquid is not ideal, mainly because the size of the obtained pyramid is relatively large, generally 10-15 μm; the amount of corrosion of silicon ...

Method used

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  • Formula of monocrystalline silicon texturing additive containing polyol and PEG
  • Formula of monocrystalline silicon texturing additive containing polyol and PEG
  • Formula of monocrystalline silicon texturing additive containing polyol and PEG

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Take the following steps in the texturing process: 1) Preparation of additives: use 1L of deionized water as a solvent, add 8.0g of MPD, 15.0g of PEG 400, 1.0g of sodium phenylacetate, and 3.0g of NaCl to fully dissolve; 2) Preparation of texturing solution: 1 L Add 35.0mL of NaOH solution with a concentration of 30% by weight in deionized water, and add 14.0mL of additives to obtain an alkaline texturing solution; 3) Clean the cut monocrystalline silicon wafers in a pre-cleaning solution at 65°C for 5 minutes Finally, wash with deionized water, and then immerse the monocrystalline silicon wafer in the texturing solution, the temperature of the texturing solution is 78 ° C, and the texturing time is 15 minutes; 4) Dip the monocrystalline silicon wafer after texturing in deionized water for cleaning 1.5 min, then wash with mixed acid for 6 min; 5) soak the pickled monocrystalline silicon wafer in deionized water for 1.5 min, then dip in 85°C deionized water and slowly pul...

Embodiment 2

[0029]Take the following steps in the texturing process: 1) Additive preparation: use 1L of deionized water as a solvent, add 12.0g of 1,2-propanediol, 20.0g of PEG600, 2.0g of sodium isophthalate, and 2.0g of KCl to fully dissolve; 2) Texture making Liquid preparation: Add 38.0 mL of 30% NaOH solution by weight to 1 L of deionized water, and add 12.0 mL of additives to obtain alkaline texturing liquid; After washing in the cleaning solution for 5 minutes, wash it with deionized water, and then immerse the monocrystalline silicon wafer in the texturing solution. The temperature of the texturing solution is 82 ° C, and the texturing time is 13 minutes; Wash in deionized water for 1.5 min, and then wash with mixed acid for 8 min; 5) Dip the acid-washed monocrystalline silicon wafer in deionized water for 1.5 min, then dip in deionized water at 85°C and slowly pull it out. The finished product was dried in a drying oven at 65°C for 3 hours to obtain a textured monocrystalline sil...

Embodiment 3

[0031] Take the following steps in the texturing process: 1) Additive preparation: with 1L deionized water as solvent, add 1,4-butanediol 15.0g, PEG800 20.0g, sodium benzoate 3.0g, Na 2 SO 4 2.0g fully dissolved; 2) preparation of texturing solution: add 40.0mL of NaOH solution with a concentration of 30% by weight in 1 L of deionized water, and add 16.0mL of additives to obtain alkaline texturing solution; 3) the cut single The crystalline silicon wafer was cleaned in a pre-cleaning solution at 65°C for 5 minutes, and then washed with deionized water, and then the monocrystalline silicon wafer was immersed in the texturing solution. The temperature of the texturing solution was 85°C, and the texturing time was 14 minutes; 4) the The monocrystalline silicon wafers after texturing were soaked in deionized water for 1.5 min, and then washed with mixed acid for 6 min; Slowly pull it out in deionized water, and dry the finished product in a drying oven at 65°C for 3 hours to obt...

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Abstract

The invention relates to an additive formula of a monocrystalline silicon texturing liquid containing a polyol and PEG. The additive formula comprises the following components: the polyol, PEG, an organic acid sodium salt, an inorganic salt and deionized water; w herein the polyol is one or a mixture of more of MPD, ethylene glycol, 1, 2-propylene glycol, glycerol and 1, 4-butanediol, and the weight ratio of the polyol to water is (0.5-2.5): 100; the PEG comprises one or a mixture of more of PEG 200, PEG 400, PEG 600, PEG 800 and PEG 1000, and the weight ratio of the PEG to water is (1.0-3.0):100; the organic acid sodium salt is one or a mixture of more of sodium succinate, sodium oxalate, sodium benzoate, sodium phenylacetate and sodium isophthalate, and the weight ratio of the organic acid sodium salt to water is (0.1-1.0): 100; the inorganic salt is one or a mixture of more of NaCl, KCl, Na2SO4, K2SO4 and Na2SiO3, and the weight ratio of the inorganic salt to water is (0.1-1.0): 100. The formula of the monocrystalline silicon surface texturing agent is as follows: 20.0-40.0 mL of a NaOH solution with the weight percentage concentration of 30% is added to 1 L of deionized water,and 8.0-18.0 mL of the additive is added.

Description

technical field [0001] The invention belongs to the technical field of monocrystalline silicon wafers for solar cells, and in particular relates to the effect of the type and content of a polyalcohol and its polymer on the texturing of monocrystalline silicon wafers. Background technique [0002] Renewable resources refer to those resources that can be used by human beings for a long time. Solar energy is one of the most important ones, and its energy is permanent for the earth. It can be seen that if human beings can rely on science and technology to obtain solar energy in large quantities, efficiently and at low cost, then the energy possessed by human beings will be unlimited. At present, there are many ways for humans to use solar energy, but the total amount is very small. The most important way is to perform photoelectric conversion, and the corresponding core technology is monocrystalline silicon solar cells. [0003] Monocrystalline silicon solar cells mainly absorb...

Claims

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Application Information

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IPC IPC(8): C30B33/10C30B29/06
CPCC30B29/06C30B33/10
Inventor 张丽陈婉君卢建红阎建辉杨海华邓小梅陈文明刘襄
Owner HUNAN INSTITUTE OF SCIENCE AND TECHNOLOGY
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