Method for preparing metal probe on basis of electrochemical etching and device

Abstract

The invention discloses a method for preparing a metal probe on the basis of electrochemical etching and a device. The method for preparing the metal probe on the basis of electrochemical etching comprises the following steps that (1) a metal wire is taken and is put into layered liquid, wherein the layered liquid comprises corrosion liquid at the upper layer and inert liquid at the lower layer; the first end of the metal wire extends into the inert liquid; the second end of the metal wire is connected with one electrode of a power supply; an electrode is taken to be connected with the other electrode of the power supply, and forms a path with the layered liquid and the metal wire; electrochemical etching is performed; and a crude metal probe is collected; and (2) an annular electrode is taken; a liquid membrane formed by the corrosion liquid covers the annular electrode; a needle point of the crude metal probe vertically passes through the liquid membrane and is in contact with a liquid metal material, wherein the liquid metal material comprises liquid metal or liquid metal alloy; and electrochemical etching is performed. The method has the advantages that metal probes in different specifications can be obtained by controlling the conditions; and high applicability and application prospects are realized.

Description

technical field [0001] The invention relates to the technical field of metal probes, in particular to a method and device for preparing metal probes based on electrochemical etching. Background technique [0002] High-quality probes are an important part of scanning probe technology. Different scanning probe technologies have different requirements for probe materials and tip diameters. For scanning tunneling microscopes, the probe materials include tungsten, iron and other materials. For tip-enhanced Raman technology, the probe materials are mainly gold and silver. Taking tungsten needles as an example, nano-tungsten needles are often used in some characterization equipment such as atomic force microscopes, probes of scanning tunneling microscopes and field emission scanning due to their high strength, high melting point, low vapor pressure, and stable chemical properties. Electron beam source for electron microscopy and low energy electron scattering. After decades of de...

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Problems solved by technology

However, many of the aforementioned methods for preparing nano-tungsten needles have certain shortcomings and are difficult to continue to promote:

[0003] 1. The above-mentioned self-sputtering method, ion milling method, and field emission assisted etching method need to use expensive equipment, and the cost is relatively high;

[0004] 2. In the "drop-off" method, the radius of curvature of the needle tip depends on the weight of the tungsten wire in the lower half of the platinum ring. However, this part is also what we need to collect, so its weight cannot be made very small, and the radius of curvature can only be made as small as possible. to 10nm

In addition, this method can only prepare tungsten with specific specifications, and its application is limited

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