A large-area perovskite solar cell preparation device and preparation method

Abstract

The invention provides a large-area perovskite solar cell preparation device and preparation method, the device sequentially includes: FTO scribing P1 module, electron transport layer coating module, infrared radiation module, electron transport layer cooling module, perovskite Precursor solution slit coating module, perovskite wet film vacuum distillation module, composite light wave annealing module, perovskite layer cooling module, hole transport layer coating module, hole layer drying module, mechanical scribing P2 module, Electrode evaporation module and mechanical scribing P3 module, wherein the perovskite wet film vacuum distillation module includes: cavity, first transfer gate, second transfer gate, pneumatic piston and multiple sets of parallel booster pump devices, the first transfer The door and the second transfer door are respectively arranged on both sides of the cavity for the passage of the FTO glass carrier, the pneumatic piston is sealed with the cavity, and multiple sets of parallel booster pump devices are connected with the cavity. The present invention can handle the wet film and can Realize the large-scale production of perovskite solar cells.

Description

technical field [0001] The invention relates to the technical preparation field of solar cells, in particular to a large-area perovskite solar cell preparation device and a preparation method. Background technique [0002] The photoelectric conversion efficiency of perovskite solar cells has risen from 3.8% to 24.2% in 10 years, which has the value of industrialization. However, most of the preparation methods of perovskite solar cells in the current experiment, especially the photoelectric conversion efficiency exceeds 20%. % of the perovskite solar cell preparation methods are mostly one-step anti-solvent method, two-step spin coating method, etc. However, the spin coating method cannot achieve large-scale production. Some large-area perovskite preparation methods, such as CVD, slit coating, doctor blade coating, and solution extrusion, have been developed. Although these methods can achieve large-area perovskite films, their film quality Still lower than the spin coating...

AI Technical Summary

Problems solved by technology

[0002] The photoelectric conversion efficiency of perovskite solar cells has risen from 3.8% to 24.2% in 10 years, which has the value of industrialization. However, most of the preparation methods of perovskite solar cells in the current experiment, especially the photoelectric conversion efficiency exceeds 20%. % of the perovskite solar cell preparation methods are mostly one-step anti-solvent method, two-step spin-coating method, etc. However, the spin-coating method cannot achieve large-scale production

Some large-area perovskite preparation methods, such as CVD, slit coating, doctor blade coating, and solution extrusion, have been developed. Although these methods can achieve large-area perovskite films, their film quality Still lower than the spin coating method, for example, the CVD method has high requirements for precise and controllable film growth, and the solution-based coating method, the wet film cannot use anti-solvent to promote crystallization in a large area. Therefore, there is currently a lack of large-scale Production methods and corresponding equipment

[0003] The prior art provides a scraping coating equipment and a thin film preparation method applied to the preparation of perovskite batteries, which can be used to prepare large-area thin films or layered structures; the prior art also provides a flexible coating based on a roll coating process. A preparation method for large-area perovskite solar cells, which realizes the preparation of flexible large-area perovskite solar cells by adjusting the roll coating process; however, the above two preparation methods do not address the key issue of how to deal with the wet film after coating. and

The prior art also provides a device for preparing the perovskite layer, which uses a vacuum buffer tank to achieve rapid vacuum. Although the pressure can be reduced rapidly and the film quality can be improved, according to the ideal gas equation, if the atmospheric pressure is reduced to 10Pa, The buffer tank must be at least 10,000 times larger than the volume of the vacuum chamber. It takes a long time to evacuate such a huge buffer tank to the order of 10Pa, which is obviously not suitable for industrial production.

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