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Soak solution and preparation method and application method thereof

A technology of soaking liquid and formula, applied in the directions of cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve the problems of increasing the backwash rate, slow processing efficiency, low yield, etc., and achieve simple soaking equipment. , good cleaning effect, high yield effect

Active Publication Date: 2019-07-12
广东剑鑫科技股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Most of the optical glass materials in the prior art are made of silica, cut into various shapes, and then subjected to a surface polishing process. The cerium oxide (rare earth) used in the polishing process has a particularly strong viscosity after being mixed with water. The grinding powder cannot be cleaned, how to clean it is a very tricky problem
The method for removing powdery cleaning agent in the prior art has the following several: 1, use potassium ferricyanide to soak in water, and the cleaning effect is unsatisfactory; It is softened and loosened, but it needs to be soaked for at least 5 minutes, and the treatment efficiency is slow. In addition, the biggest disadvantage is that the sewage cannot be effectively treated
3. Using a strong alkaline optical cleaning agent for treatment requires repeated cleaning, which increases the rate of backwashing, which increases the chance of scratching the glass, resulting in low yield and high production costs.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0036] A preparation method for soaking liquid, comprising the following steps:

[0037] Material preparation step: take each raw material respectively according to the formula ratio, and set aside;

[0038] Stirring steps: Add the formula amount of water into the container, then add the formula amount of amino acid and citric acid into the container for the first stirring, after stirring evenly, then add the formula amount of hydroxyethylidene diphosphonic acid into the container for Stir for the second time. After stirring evenly, the first mixed solution is obtained; finally, nonionic surfactants, amphoteric surfactants, anionic surfactants, and dimethyl sulfoxide are added to the container respectively for the second mixed solution. Stir, and after stirring evenly, the soaking liquid is obtained.

[0039] As a preferred embodiment, in the stirring step, the stirring time for the first stirring is 8-10 minutes.

[0040] As a preferred embodiment, in the stirring step, the...

Embodiment 1

[0045] A soaking solution comprising the following components by weight percentage:

[0046] Amino acid 10%, citric acid 10%, hydroxyethylidene diphosphonic acid (HEDP) 5%, nonionic surfactant 3%, zwitterionic surfactant 1%, anionic surfactant 1%, dimethyl sulfoxide 3 %, the balance of water.

[0047] Described nonionic surfactant is AEO-3 surfactant and BASF isomerized alcohol XL90, wherein, the addition of AEO-3 surfactant is 1% of soaking liquid gross weight, the addition of BASF isomerized alcohol XL90 is 2% of the total weight of soaking liquid.

[0048] The zwitterionic surfactant is cocamidopropyl betaine.

[0049] The anionic surfactant is alkyl diphenyl ether disulfonate, specifically DOWFAX8390 from American Dow.

[0050]A preparation method for soaking liquid, comprising the following steps:

[0051] Material preparation step: take each raw material respectively according to the formula ratio, and set aside;

[0052] Stirring steps: Add the formula amount of wa...

Embodiment 2

[0054] A soaking solution comprising the following components by weight percentage:

[0055] Amino acid 7%, citric acid 8%, hydroxyethylidene diphosphonic acid 3%, nonionic surfactant 2%, zwitterionic surfactant 0.5%, anionic surfactant 0.5%, dimethyl sulfoxide 2%, Yu amount of water.

[0056] Described nonionic surfactant is AEO-3 surfactant and BASF isomerized alcohol XL90, wherein, the addition of AEO-3 surfactant is 1% of soaking liquid gross weight, the addition of BASF isomerized alcohol XL90 is 1% of the total weight of soaking liquid.

[0057] The zwitterionic surfactant is cocamidopropyl betaine.

[0058] The anionic surfactant is alkyl diphenyl ether disulfonate, specifically DOWFAX8390 from American Dow.

[0059] A preparation method for soaking liquid, comprising the following steps:

[0060] Material preparation step: take each raw material respectively according to the formula ratio, and set aside;

[0061] Stirring steps: Add the formula amount of water int...

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PUM

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Abstract

The invention discloses a soak solution. The soak solution comprises the following components: in percent by weight, 7-10% of amino acid, 8-10% of citric acid, 3-5% of hydroxyethylidene-1,1-diphosphonic acid, 2-3% of a nonionic surfactant, 0.5-1% of a zwitterionic surfactant, 0.5-1% of an anionic surfactant, 2-3% of dimethyl sulfoxide and the balance water. The invention also discloses a preparation method and application method of the soak solution. The soak solution has the characteristics of a good cleaning effect, a high yield, low cost, environmental protection, no inorganic matter and noheavy metal.

Description

technical field [0001] The invention relates to a soaking liquid, in particular to a soaking liquid, a preparation method and a use method thereof. Background technique [0002] my country is rich in rare earth resources, and the reserves of industrial cerium resources are as high as 18 million tons. Cerium oxide polishing materials are used in many aspects due to their advantages such as strong cutting ability, short polishing time, high polishing precision, and clean operating environment, such as The polishing of lenses, optical fibers, optical components, silicon wafers, ITO glass, mobile phone glass, aviation glass, integrated circuit substrates, etc. has become one of the important materials for chemical mechanical polishing. [0003] Most of the optical glass materials in the prior art are made of silica, cut into various shapes, and then subjected to a surface polishing process. The cerium oxide (rare earth) used in the polishing process has a particularly strong visc...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C11D1/94C11D3/20C11D3/33C11D3/34C11D3/36C11D3/60B08B3/08
CPCC11D1/94C11D3/33C11D3/2086C11D3/361C11D3/3454B08B3/08C11D1/90C11D1/22C11D1/72C11D2111/18
Inventor 邓剑明
Owner 广东剑鑫科技股份有限公司
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