Etching monitoring device and etching monitoring method
A monitoring device and etching technology, applied in optics, instruments, electrical components, etc., can solve problems such as lack of monitoring means, and achieve the effect of promoting development and improving etching precision
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[0049] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0050] see figure 1 , the present invention provides an etching monitoring device, comprising: a plurality of monitoring units 1, each of which includes an incident light source 11 and a signal processing module 12 corresponding to the incident light source 11;
[0051] Each incident light source 11 is set corresponding to an etching area 2 on the substrate to be etched, and different incident light sources 11 correspond to different etching areas 2;
[0052] The incident light source 11 is used to emit incident light to its corresponding etched area 2 and reflect it through the etched area 2 to generate reflected light;
[0053] The signal processing module 12 is configured to receive reflected light generated by incident light emitted by it...
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