Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Cultivation method of high-temperature-resistant gelidium amansii

A cultivating method and technology of lily, applied in horticultural methods, botanical equipment and methods, cultivation and other directions, can solve the problems affecting the yield of cultivating lily in summer, low growth temperature upper limit, poor high temperature resistance ability, etc., and achieves convenient application. , The effect of prolonged breeding cycle and fast growth rate

Active Publication Date: 2019-04-19
SUZHOU UNIV
View PDF7 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The lower limit of the growth temperature of Geliflower is low, and it can tolerate a certain low temperature, but the upper limit of the growth temperature is low, and the high temperature resistance is poor
As the temperature rises in summer, the surface temperature of seawater can reach 32°C in July, August, and September. In order to avoid the high temperature that may easily cause the rotting of agaric, the sea area often spends the summer indoors, which leads to an increase in the cost of cultivation and seriously affects the cultivation of summer crops. The yield of Glycyrrhizae, and temperature is the determinant factor affecting the production and breeding of Glycyrrhizae

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cultivation method of high-temperature-resistant gelidium amansii
  • Cultivation method of high-temperature-resistant gelidium amansii
  • Cultivation method of high-temperature-resistant gelidium amansii

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] A method for screening and cultivating high-temperature-resistant Geliflower, comprising the following steps:

[0036] (1) Collect natural growth agaricus, select under an anatomical microscope the agaricus with few algae attached organisms, complete growth points and bright color, and use a brush to remove the attachments;

[0037] (2) The algal body of step (1) undergoes 60 Coγ-rays were irradiated at a dose of 700Gy for 1h, then darkened for 24h, and the culture medium was replaced;

[0038] (3) placing the Geliflower after the dark treatment in step (2) at 39° C., and stressing it in a water bath for 30 minutes;

[0039] (4) Place the Geliflower treated in step (3) at 35° C., and culture it under light stress for 96 hours for preliminary screening of high temperature resistance, collect algal tips of surviving algae, light intensity 2500 lux, and light time 12 hours;

[0040] (5) Place the algae tips collected in step (4) at 24°C, culture them under light for 4 we...

Embodiment 2

[0057] A method for screening and cultivating high-temperature-resistant Geliflower, comprising the following steps:

[0058] (1) Collect natural growth agaricus, select under an anatomical microscope the agaricus with few algae attached organisms, complete growth points and bright color, and use a brush to remove the attachments;

[0059] (2) The algal body of step (1) undergoes 60 Coγ-rays were irradiated at a dose of 500Gy for 70min, then treated in dark for 25h, and the medium was replaced;

[0060] (3) placing the Geliflower after the dark treatment in step (2) at 38° C., and stressing it in a water bath for 35 minutes;

[0061] (4) Place the Geliflower treated in step (3) at 36°C, and culture it under light stress for 90 hours for preliminary screening of high temperature resistance, collect the algal tips of the surviving algal bodies, light intensity 3000lux, light time 10h;

[0062] (5) Place the algae tips collected in step (4) at 25°C, culture them under light for...

Embodiment 3

[0065] A method for screening and cultivating high-temperature-resistant Geliflower, comprising the following steps:

[0066] (1) Collect natural growth agaricus, select under an anatomical microscope the agaricus with few algae attached organisms, complete growth points and bright color, and use a brush to remove the attachments;

[0067] (2) The algal body of step (1) undergoes 60 Coγ-rays were irradiated at a dose of 900Gy for 50min, then treated in dark for 20h, and the culture medium was replaced;

[0068] (3) placing the Geliflower after the dark treatment in step (2) at 40° C., and stressing it in a water bath for 25 minutes;

[0069] (4) Place the Geliflower treated in step (3) at 34°C, and culture it under light stress for 100 hours for preliminary screening of high temperature resistance, collect the algal tips of the surviving algae, light intensity 2000lux, light time 14h;

[0070] (5) Place the algae tips collected in step (4) at 20°C, culture them under light f...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a cultivation method of high-temperature-resistant gelidium amansii and belongs to the technical field of gelidium amansii study and development application. High-temperature-resistant gelidium amansii can be obtained by accurate screening through gradient high-temperature stress, low-temperature culture and high-temperature screening after mutagenization, and the method ishigh in repeatability, reasonable and easy to implement and convenient and quick in application. Gelidium amansii obtained by cultivation can normally grow at 32 DEG C and is high in sea area breeding growth speed. High-temperature-resistant gelidium amansii mutant obtained by induced cultivation enables gelidium amansii breeding enterprises to realize gelidium amansii summer normal breeding without changing a breeding mode by the gelidium amansii breeding enterprises, breeding period is prolonged, year-round production bearing can be realized by the gelidium amansii enterprises, and economicbenefit of gelidium amansii industry is increased greatly.

Description

technical field [0001] The invention relates to a method for cultivating high-temperature-resistant rock lily, belonging to the technical field of research, development and application of rock lily. Background technique [0002] Gelidium amansii belongs to Rhodophyta (Rhodophyta) True red algae (Florideae) Gelidiales (Gelidiales) Gelidiaceae (Gelidiaceae) Gelidium (Gelidium), algal body is purple red or reddish yellow, erect clusters Generally 10-25cm high. Geliflower is a treasure of the sea, rich in nutrients, containing calcium, magnesium, potassium, sodium and various inorganic salts, polysaccharides and other ingredients, it has been collected and eaten by the coastal masses of our country long ago. The content of agaric agar is usually more than 30%, which is the main raw material seaweed for making agar. Agar can also be produced from Gracilaria, chicken feathers, seaweed, etc., but in terms of its color, transparency, hardness, taste and quality. They are not as go...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A01G33/00A01G7/04
CPCA01G7/04A01G33/00Y02A40/80
Inventor 沈颂东袁安祥
Owner SUZHOU UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com