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High-temperature and high-emissivity hafnium oxide base infrared radiating coating and preparing method thereof

A technology of infrared radiation coating and high emissivity, applied in coating, metal material coating process, fusion spraying, etc., can solve the problems of low emissivity and low service temperature, so as to improve emissivity and enhance emissivity , Enhance the effect of phonon absorption

Inactive Publication Date: 2019-02-19
WUHAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The main purpose of the present invention is to provide a new type of high-temperature high-emissivity coating material for the shortcomings of traditional infrared radiation coating materials (ferrite system, perovskite system, spinel system, etc.) with low service temperature and low emissivity at high temperatures. Hafnium oxide-based infrared radiation coating, which has the advantages of high full-band emissivity, high service temperature, and long life, and the preparation process involved is simple, the synthesis time is short, and the energy consumption is low, which is suitable for popularization and application

Method used

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  • High-temperature and high-emissivity hafnium oxide base infrared radiating coating and preparing method thereof
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  • High-temperature and high-emissivity hafnium oxide base infrared radiating coating and preparing method thereof

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Embodiment 1

[0044] A high-temperature and high-emissivity hafnium oxide-based infrared radiation coating, the specific preparation method and corresponding process parameters are as follows:

[0045] with HfO 2 Powder and Sm 2 o 3 Powder is the raw material (the mass percent of each raw material is HfO 2 Powder 90%, Sm 2 o 3 powder 10%), adding deionized water and binder (polyvinyl alcohol) to it and mixing and grinding to obtain a uniform slurry, wherein the binder accounts for 5% by mass of the raw material, and the volume ratio of water to raw material is 1.5:1; Spherical particle powder is prepared by spray granulation method. During spray granulation, the temperature of the drying tower is 180°C, and the rotation speed of the material pump is 3000r / min; Cool and sieve the composite powder with a particle size of 40-56 μm;

[0046] The composite powder is sprayed on the pretreated tungsten sheet by atmospheric plasma spraying method, wherein: the spraying distance is 130mm, the ...

Embodiment 2

[0052] A high-temperature and high-emissivity hafnium oxide-based infrared radiation coating, the specific preparation method and corresponding process parameters are as follows:

[0053] with HfO 2 Powder and Gd 2 o 3 Powder is the raw material (the mass percent of each raw material is HfO 2 Powder 90%, Gd 2 o 3 powder 10%), adding deionized water and binder (polyvinyl alcohol) to it and mixing and grinding to obtain a uniform slurry, wherein the binder accounts for 5% by mass of the raw material, and the volume ratio of water to raw material is 1.5:1; Spherical particle powder is prepared by spray granulation method. During spray granulation, the temperature of the drying tower is 180°C, and the rotation speed of the material pump is 3000r / min; Cool and sieve the composite powder with a particle size of 40-56 μm;

[0054] The composite powder is sprayed on the pretreated tungsten sheet by atmospheric plasma spraying method, wherein: the spraying distance is 130mm, the ...

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Abstract

The invention discloses a high-temperature and high-emissivity hafnium oxide base infrared radiating coating. According to the high-temperature and high-emissivity hafnium oxide base infrared radiating coating, HfO2 powder and rare earth oxide powder serve as main raw materials, water and a binding agent are added in the HfO2 powder and the rare earth oxide powder to prepare uniform slurry, and then the high-temperature and high-emissivity hafnium oxide base infrared radiating coating is formed sequentially through spray granulation, high-temperature roasting and heat spraying. According to the high-temperature and high-emissivity hafnium oxide base infrared radiating coating, compounding of HfO2 powder and Gd2O3 or Sm2O3 and other rare earth oxide is provided for the first time, the heatspraying technology is combined, the full-wave band normal integral emissivity of the obtained high infrared radiating coating at the normal temperature can reach 0.85 or above, the slow ascending tendency is achieved along with increasing of the high temperature, and good high temperature resisting performance and full-wave band infrared radiation performance can be combined; and the related preparing technology is simple, the synthesis time is short, energy consumption is low, and important study and popularization value is achieved.

Description

technical field [0001] The invention belongs to the technical field of preparation and application of special coatings, and in particular relates to a high-temperature, high-emissivity hafnium oxide-based infrared radiation coating and a preparation method thereof. Background technique [0002] Infrared radiation coating is a functional material that has been widely used in medical care, new building materials, industrial furnaces and other fields. Nowadays, with the development of science and technology, infrared radiation coatings are also developing in the direction of high-end applications, such as aerospace, military high-end equipment, new electronic devices and other fields. [0003] Infrared emissivity and service temperature are two key performance indicators of infrared radiation coatings. Traditional infrared radiation coating materials include ferrite system, perovskite system, spinel system, etc., all of which have high infrared emissivity and phase stability b...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C4/134C23C4/11
CPCC23C4/11C23C4/134
Inventor 曾鲜刘富生李淑浩程旭东
Owner WUHAN UNIV OF TECH
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