A preparation method of superhydrophobic surface with directional transport function
A super-hydrophobic surface and functional technology, applied in the process of producing decorative surface effects, manufacturing microstructure devices, coatings, etc., can solve the problems of uncontrollable scratching force, poor controllability, and ineffective cooperation, etc., to achieve Improvement of superhydrophobic performance, precise position of vapor deposition, and the effect of increasing rolling performance
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[0059] In conjunction with the accompanying drawings, a method for preparing a superhydrophobic surface with directional transport function, comprising the following steps:
[0060] The first step is to spin-coat UV photoresist (positive resist) for the first UV photolithography
[0061] (1) According to the needs, pre-design the pattern to be photolithographic;
[0062] (2) Take a silicon substrate 1 with a size of 25mm×25mm, ultrasonically clean it with acetone, ethanol, and deionized water for 10 minutes, and dry it with nitrogen;
[0063] (3) Put the clean silicon substrate 1 on the homogenizer, use a micropipette to drop an appropriate amount of UV photoresist 2 (positive resist) on the silicon substrate 1, the model is AZ5214E, and set the pre-spin coating speed and time were 500rpm and 10s respectively, and the rotating speed and time of spin coating were 4000rpm and 30s respectively, and the glue was evenly distributed;
[0064] (4) Horizontally fix the silicon subst...
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