Low-cost N type double-side battery preparation method

Abstract

The invention relates to a low-cost N type double-side battery preparation method. The method comprises the following steps of (1) cleaning and texturizing; (2) boron and phosphorus diffusion; (3) polishing, etching, and BSG / PSG removing in the back side; (4) deposition of alumina in the front side; (5) deposition of SiNx in the front and back sides; (6) laser grooving in the front and back sides;(7) pickling; (8) activation; (9) chemical plating of Ni; (10) chemical silvering; (11) annealing; and (12) laser edging and photoelectric processing. According to the method, the application amountof silver slurry is reduced greatly, the cost of silver slurry is reduced by more than 70%, a metal grid line is thinner, the shading area is small, and the conversion efficiency is higher.

Description

technical field [0001] The invention belongs to the field of solar cells, in particular to a preparation method of a low-cost N-type double-sided cell produced by electroless metal electrode plating technology. Background technique [0002] Photovoltaic power generation is a clean, non-polluting renewable energy source. With the emphasis on environmental protection in various countries, photovoltaic power generation is regarded as an important part of the future low-carbon economy. From the analysis of the current situation of my country's photovoltaic industry, the competition in the entire industry is becoming more and more fierce. The traditional photovoltaic power generation technology can no longer meet the current requirements of the photovoltaic industry due to reasons such as high cost and low conversion efficiency. With the introduction of new high-efficiency technologies, The conversion efficiency of photovoltaic cells is increasing every year, but there is still no...

AI Technical Summary

Problems solved by technology

[0003] The traditional screen printing technology has the following technical disadvantages. First, the cost is high and the amount of silver paste is large; second, the electrode grid formed by printing is wider, the shading area is larger, and the conversion efficiency is low.

[0004] In addition, the current market has also seen the application of electroplating or chemical plating in crystalline silicon solar cells to replace the traditional screen printing technology, and the emerging electroplating or chemical plating is basically based on light-induced electroplating, but this method has the following disadvantages: First, the investment in equipment is large, and ghost plating is likely to occur during the electroplating process; second, light-induced electroplating equipment is mostly flat-plate electroplating, which can only be used for single-sided electroplating, and double-sided simultaneous electroplating is not possible; third, light-induced electroplating equipment Electroplating or other electroless plating often requires masking during metal deposition, and the preparation method is complicated; fourth, the electrode clip needs to be in contact with the cell during the electroplating process, which may easily cause debris and affect the high-quality rate of the cell

Therefore, the current electroplating or electroless plating has not been able to meet the requirements of modern production.