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Preparation system and preparation method of grating structure

A technology for a grating structure and a preparation system, applied in the field of gratings, can solve the problems of high processing cost, high processing cost and complexity, and achieve the effects of accurate positioning, simple grating formation method and time reduction.

Pending Publication Date: 2019-01-25
BOE TECH GRP CO LTD
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Problems solved by technology

However, the existing methods are relatively complicated, and it is difficult to quickly and accurately form different gratings in different regions of the same substrate.
For example, although electron beam direct writing can realize nanoscale arbitrary shape structures on silicon substrates, the grating processing time is long and the processing costs are high, resulting in high processing costs.

Method used

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  • Preparation system and preparation method of grating structure
  • Preparation system and preparation method of grating structure
  • Preparation system and preparation method of grating structure

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Embodiment Construction

[0064] Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many forms and should not be construed as limited to the examples set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art. The described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided in order to give a thorough understanding of embodiments of the present disclosure.

[0065] In the drawings, the thicknesses of regions and layers may be exaggerated for clarity. The same reference numerals in the drawings denote the same or similar structures, and thus their detailed descriptions will be omitted.

[0066] When a structure is "on" another structure, it may me...

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Abstract

The invention provides a preparation system and a preparation method of a grating structure, which belong to the technical field of gratings. The grating structure comprises a plurality of grating regions which are mutually isolated on a substrate. The preparation system of the grating structure comprises a laser device, an optical path system and a sample stage, wherein the laser device is for providing a laser beam; the optical path system is used for dividing the laser beam into at least two coherent light beams, and controlling the coherent light beams to interfere in a target region; andthe sample stage is used for fixing and moving the substrate, such that the grating regions of the substrate are sequentially positioned in the target region according to a preset path and expose to form a grating. The preparation system and the preparation method of the grating structure can prepare the grating structure quickly and precisely.

Description

technical field [0001] The present disclosure relates to the field of grating technology, in particular to a preparation system and method of a grating structure. Background technique [0002] Grating element is an important optical element, which is widely used in the fields of spectroscopy, metrology, optical communication and information processing. [0003] Grating processing is currently divided into methods such as electron beam direct writing and ultraviolet exposure according to the requirements of processing accuracy and substrate. However, the existing methods are relatively complicated, and it is difficult to quickly and accurately form different gratings in different regions of the same substrate. For example, although electron beam direct writing can realize nanoscale arbitrary shape structures on silicon substrates, the grating processing time is long and the processing costs are high, resulting in high processing costs. [0004] The above information disclos...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18
CPCG02B5/1847G02B5/1857
Inventor 孟宪芹王维陈小川孟宪东王方舟凌秋雨
Owner BOE TECH GRP CO LTD
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