Method and device for obtaining light intensity distribution based on non-uniform calculation

Abstract

The invention discloses a light intensity distribution obtaining method and device based on non-uniform calculation. The method comprises the following steps: uniformly sampling a light source function and a pupil function in a frequency domain to obtain a light source sampling matrix and a pupil sampling matrix based on an intersecting area; The non-uniform inverse Fourier transform is applied tothe sample matrix of light source and pupil to obtain the cross transfer matrix. Determining a frequency domain kernel function of the cross transfer matrix; The sampling matrix of the mask functionin frequency domain and the sampling matrix of the kernel function in frequency domain are established. According to the sampling matrix of the mask function in frequency domain and the sampling matrix of the kernel function in frequency domain, the light intensity distribution in the specified position of the user is obtained through the inverse non-uniform Fourier transform. In the present application, since the sampling method based on the intersecting area is adopted, the calculation accuracy is improved, and at the same time, the inverse non-uniform Fourier transform is adopted, and underthe same sampling density, the calculation amount of the light intensity distribution can be reduced, thereby shortening the calculation time and improving the efficiency of photoresist lithography.

Description

technical field [0001] The present application belongs to the technical field of semiconductor lithography, and in particular relates to a method and device for obtaining light intensity distribution based on non-uniform calculation. Background technique [0002] Smart devices are inseparable from today's life, and smart phones, smart homes and smart wearable devices are generally related to everyone. The operation of smart devices is more of the silent operation of the chip behind the scenes. At present, as smart device functions and related performance requirements are getting higher and higher, the requirements for chips are also growing. With the change of technology used by chip manufacturers and the development of production equipment, materials and processes, the integration of chips is getting higher and higher, and the number of transistors per unit area is doubled, which eventually makes the performance of smart devices higher and higher, and relatively productio...

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Problems solved by technology

[0005] This application provides a method and device for obtaining light intensity distribution based on non-uniform calculations, which can be used to solve related technologies. In order to ensure calculation accuracy and increase sampling density, the calculation amount of light intensity distribution increases, thereby increasing calculation time and reducing The problem of the efficiency of photolithography on photoresist

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