Preparation method of unbraced high-strength polyether sulfone flat-sheet microporous membrane
A polyethersulfone, high-strength technology, applied in the field of unsupported high-strength polyethersulfone flat microporous membrane and its preparation, can solve the problems of easy breakage, poor repeatability, unsuitable for industrialization, difficult pore structure regulation, etc., and achieve a good membrane. Structure and performance, multi-process feasibility, good adjustment effect
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Embodiment 1
[0033] Embodiment 1: 16% polyethersulfone resin (Basf Corporation 6020P), 15% diethylene glycol, 15% polyvinylpyrrolidone K-17 and 0.5% polyoxyethylene-polyoxypropylene block copolymer Add F127 and 53.5% dimethylformamide into a stirring tank, stir at 60°C for 12 hours, filter and vacuum defoam for 24 hours to obtain a casting solution. Extrude and cast the above-mentioned casting solution with a temperature of 35 degrees on a steel plate through a spinneret to obtain a support to obtain a flat original film. After a period of water vapor with a humidity of 95%, the residence time is 100s, after steam-liquid phase inversion, it is immersed in a rinsing water tank, and finally dried to prepare an unsupported high-strength polyethersulfone flat microporous membrane. The surface of the membrane is a smooth and single open microporous structure (attached figure 1 , 4 ), the pores at 20 μm below the surface cortex 2 on the cross-section are the smallest, here is the separation la...
Embodiment 2
[0034] Embodiment 2: 14% polyethersulfone resin (Basf Corporation 6020P), 11% triethylene glycol, 14% polyvinylpyrrolidone K-30 and 1.5% sulfonated polyethersulfone (sulfonated degree 25% ), 59.5% dimethylacetamide was added in a stirring tank, stirred at 60° C. for 12 hours, filtered, and vacuum defoamed for 24 hours to obtain a casting solution. Extrude and cast the above-mentioned casting solution at a temperature of 30°C on a steel plate through a spinneret to obtain a support to prepare a flat original film. After a period of water vapor with a humidity of 97%, the residence time is 180s, after steam-liquid phase inversion, immersed in a rinsing water tank, and finally dried to prepare an unsupported high-strength polyethersulfone flat microporous membrane. The surface of the membrane is a smooth and single-opened microporous structure. The pores at 25 μm below the surface skin layer 2 on the cross-section are the smallest. Here is the separation layer 1. The pore diamete...
Embodiment 3
[0035] Embodiment 3: 18% polyethersulfone resin (Basf Corporation 6020P), 18% ethylene glycol, 12% polyvinylpyrrolidone K-30 and 42% N-methylpyrrolidone, 10% dimethyl sulfoxide are added by weight percentage Stir at 60° C. for 12 hours in a stirring tank, filter, and vacuum defoam for 24 hours to obtain a casting solution. Extrude and cast the above-mentioned casting solution at a temperature of 45°C on a steel plate through a spinneret to obtain a support to prepare a flat original film. After a period of water vapor with a humidity of 97%, the residence time is 30s, after steam and liquid phase inversion, it is immersed in a rinsing water tank, and finally dried to prepare an unsupported high-strength polyethersulfone flat microporous membrane. The surface of the membrane is a smooth and single-open microporous structure. The pores at 10 μm below the surface skin layer 2 on the cross section are the smallest. This is the separation layer 1. The pore diameters from the separa...
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