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Graphene cladded silylene as well as preparation method and application method thereof

A technology of ene-coated silicene and graphene, which is applied in the field of silicene preparation, can solve problems such as high cost, enlarged unit cell, and reduced symmetry, and achieve the effect of loose preparation conditions and simple preparation methods

Active Publication Date: 2018-12-11
SUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, when evaporated atoms epitaxially grow silicene on the substrate, due to the strong interfacial interaction, silicene will be restructured, and the degree of warping of the atomic layer will change. Some atoms will rise and some atoms will fall, resulting in The unit cell becomes larger, the symmetry decreases, or a few-layer structure is formed, thereby destroying the Dirac-Fermi characteristics of silicene and affecting the performance of the silicene film layer material. In addition, the silicene obtained through the above substrate Not only is the cost high, but the size is extremely small and cannot be exposed to the air
Some researchers also use alumina coating to protect the silicene synthesized on the silver surface. However, the silicene prepared in this way is very unstable and will be completely oxidized in less than a day.

Method used

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  • Graphene cladded silylene as well as preparation method and application method thereof
  • Graphene cladded silylene as well as preparation method and application method thereof
  • Graphene cladded silylene as well as preparation method and application method thereof

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Embodiment Construction

[0040] figure 1 A schematic flowchart of a method for preparing graphene-coated silicene according to an embodiment of the present invention is shown. Such as figure 1 Shown, this preparation method comprises the steps:

[0041] S100, placing the metal catalytic substrate in the reaction chamber, removing the natural oxide layer on the surface of the metal catalytic substrate, exposing the metal layer, selecting a gaseous hydrocarbon carbon source as a precursor, and forming graphite on the metal layer by chemical vapor deposition alkene;

[0042] S200, closing the gaseous hydrocarbon carbon source in the reaction chamber, introducing a silicon-containing gas source and a reducing gas, so that the evaporated silicon atoms epitaxially grow silicene on the graphene surface;

[0043] S300. Turn off only the silicon-containing gas source, or simultaneously turn off the silicon-containing gas source and the reducing gas, and feed a gaseous hydrocarbon carbon source to coat carbo...

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Abstract

The invention provides graphene cladded silylene as well as a preparation method and an application method thereof. The preparation method comprises the following steps: placing a metal catalysis substrate in a reaction cavity; removing a natural oxidization layer on the metal catalysis substrate and exposing a metal layer; selecting a gas-state hydrocarbon type carbon source as a precursor and forming graphene on the metal layer through a chemical vapor deposition method; closing the gas-state hydrocarbon type carbon source of the reaction cavity and introducing a silicon-containing gas source and reductive gas, so as to form silylene on a surface layer of the graphene through evaporated silicon atoms via epitaxial growth; only closing the silicon-containing gas source or closing the silicon-containing gas source and reductive gas at the same time; introducing the gas-state hydrocarbon type carbon source to clad carbon atoms on the surface of the graphene, so as to obtain the graphenecladded silylene. The silylene obtained by the preparation method can keep an original structure in the air for two or more than two years; the method breaks through a traditional method, and preparation conditions are relatively loose and simple.

Description

technical field [0001] The invention relates to the technical field of silicene preparation, in particular to a graphene-coated silicene prepared based on metal catalysis, a preparation method and a use method thereof. Background technique [0002] Sicene is a two-dimensional nanomaterial in which silicon atoms are arranged in a planar honeycomb shape, and has a good two-dimensional crystal structure and electrical properties. Compared with graphene with zero band gap, silicene has a certain forbidden band width, so it has broad application prospects in the field of semiconductor electronic devices and optoelectronic devices. sp of silicene 2 -sp 3 The structural properties of the surface are extremely sensitive, resulting in a very active chemical environment, which makes the preparation of silicene a strong limitation. [0003] The current method for preparing silicene is silicon source evaporation epitaxial growth method. In a high-vacuum environment, silicon wafers a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B32/186C01B32/194C01B33/027B82Y30/00
CPCB82Y30/00C01B33/027C01B32/186C01B32/194
Inventor 孙旭辉聂宇婷
Owner SUZHOU UNIV
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