Ultraviolet irradiation machine and equipment for making alignment film

Abstract

The invention provides an ultraviolet irradiation machine and equipment for making an alignment film. The ultraviolet irradiating machine comprises: an ultraviolet irradiating machine body, a refrigerating device spaced apart from the ultraviolet irradiating machine body, a first gas input pipeline connected to the refrigerating device, and a refrigerating device connected to the ultraviolet irradiating machine body and the refrigerating device Gas pipeline: through the cooling device, the temperature of the first gas input by the first gas input pipeline is cooled to be lower than a preset threshold range, and then passed into the ultraviolet irradiation machine body through the gas pipeline to reduce the temperature of the ultraviolet irradiation machine body And the temperature of the glass substrate that enters the body of the ultraviolet irradiation machine, so that the glass substrate will not be deformed due to high temperature in the ultraviolet irradiation machine, reducing the risk of scratches between the glass substrate and the ultraviolet irradiation machine, and avoiding glass substrates. .

Description

technical field [0001] The invention relates to the field of display technology, in particular to an ultraviolet irradiation machine and equipment for making an alignment film. Background technique [0002] Thin Film Transistor (TFT) is the main driving element in current Liquid Crystal Display (LCD) and Active Matrix Organic Light-Emitting Diode (AMOLED). It is related to the display performance of the flat panel display device. [0003] Most of the liquid crystal displays currently on the market are backlight liquid crystal displays, which include a liquid crystal display panel and a backlight module. The working principle of the liquid crystal display panel is to pour liquid crystal molecules between the thin film transistor array substrate (ThinFilm Transistor Array Substrate, TFT Array Substrate) and the color filter (ColorFilter, CF) substrate, and apply pixel voltage on the two substrates respectively. and the common voltage, through the electric field formed betwee...

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Problems solved by technology

[0007] 1. The temperature of the glass substrate after the drying machine is close to 150°C, while the surface temperature of the lamp tube is about 200°C when the EUV is turned on. When the glass substrate passes through the EUV irradiation area, the glass substrate will be greatly deformed and may cause scratches. In severe cases even cause fragments

[0008] 2. In order to avoid the risk of scratching the glass substrate, the EUV Gap (the distance between the ultraviolet lamp of the ultraviolet irradiation machine and the Glass) is generally adjusted to more than 6mm (the original specification is about 3mm), and the increase in the distance will cause the EUV process capability to decline greatly , which in turn reduces the quality of the alignment film (such as non-sticking of the alignment film, reduction of the pretilt angle, etc.)

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