In-situ preparation method and application of electrode of electrochemical capacitor
A capacitor electrode, in-situ preparation technology, applied in the hybrid capacitor electrode, hybrid/electric double layer capacitor manufacturing and other directions, can solve the problems of increasing the internal resistance of the electrode material, losing the specific surface area of the active material, and reducing the utilization rate of the active material.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0016] (1) Put nickel foam (G-Ni) in 10% (wt%) sodium carbonate solution at 50 o C for 30 min, and then rinsed with a large amount of water to obtain the cleaned G-Ni; then, using G-Ni as the working electrode, saturated calomel (SCE) as the reference electrode, and platinum as the counter electrode, at 1 mol· L -1 In the NaOH solution, in the potential range of 0.1 ~ 0.6 V (vs SCE), at a scan rate of 100 mV s -1 After repeating the scanning cycle 200 times, the G-Ni was soaked in water, and then dried in the air at room temperature to obtain a nano-surfaced nickel foam (nano-G-Ni).
[0017] (2) Add 0.1 g nickel acetate, 0.1 g cobalt acetate, 0.2 g glucose, and 2.5 g dicyandiamide into 35 mL of water, and stir until the solids are completely dissolved to form a homogeneous solution (referred to as the precursor solution); then the above nano -G-Ni was immersed in the precursor solution and kept under slow stirring for 1 min, then the nano-G-Ni was taken out, dried in the hot...
Embodiment 2
[0025] Step (1) is the same as step (1) in Example 1.
[0026] (2) Add 0.1 g nickel acetate, 0.1 g cobalt acetate, 0.2 g glucose, and 2.5 g dicyandiamide into 35 mL of water, and stir until the solids are completely dissolved to form a homogeneous solution (referred to as the precursor solution); then the above nano -G-Ni was immersed in the precursor solution and kept under slow stirring for 1 min, then the nano-G-Ni was taken out, dried in the hot air flow for 5 min, then immersed in the precursor solution, kept under slow stirring for 1 min, Then the nano-G-Ni was taken out and dried in air for 5 min; this immersion / drying process was repeated 10 times to obtain the precursor-loaded nano-G-Ni;
[0027] Steps (3), (4), and (5) are the same as steps (3), (4), and (5) of Example 1, respectively.
[0028] The measurement result is:
[0029] The current is 1 A g -1 and 2 A g -1 The specific capacitance at the time is 1033 F·g -1 and 896 F g -1 ;
[0030] The specific capa...
Embodiment 3
[0032] Step (1) is the same as step (1) in Example 1.
[0033] (2) Add 0.1 g nickel acetate, 0.1 g cobalt acetate, 0.2 g glucose, and 2.5 g dicyandiamide into 35 mL of water, and stir until the solids are completely dissolved to form a homogeneous solution (referred to as the precursor solution); then the above nano -G-Ni was immersed in the precursor solution and kept under slow stirring for 1 min, then the nano-G-Ni was taken out, dried in the hot air flow for 5 min, then immersed in the precursor solution, kept under slow stirring for 1 min, Then the nano-G-Ni was taken out and dried in air for 5 min; this immersion / drying process was repeated 20 times to obtain the precursor-loaded nano-G-Ni;
[0034] Steps (3), (4), and (5) are the same as steps (3), (4), and (5) of Example 1, respectively.
[0035] The measurement result is:
[0036] The current is 1 A g -1 and 2 A g -1 The specific capacitance at the time is 978 F·g -1 and 706 F g -1 ;
[0037] The specific capac...
PUM
Property | Measurement | Unit |
---|---|---|
Specific capacitance | aaaaa | aaaaa |
Specific capacitance | aaaaa | aaaaa |
Specific capacitance | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com