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Preparation method of high-precision photoresist

A photoresist and high-precision technology, applied in the field of photolithography, can solve the problems of slow curing speed of photoresist, insufficient resolution of photolithography, and low integration of integrated circuits, so as to improve curing efficiency, broad application prospects, The effect of high water affinity

Inactive Publication Date: 2018-11-13
FOSHAN GAOMING DISTRICT ZHUAHE NEW MATERIAL TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The technical problem mainly solved by the present invention aims at the defects of slow curing speed of existing photoresist, large shrinkage after curing, insufficient photolithography resolution and low integration degree of integrated circuits. A kind of preparation method of high-precision photoresist

Method used

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Examples

Experimental program
Comparison scheme
Effect test

example 1

[0026]Put 700mL of sodium aluminate solution with a mass fraction of 20% into a plastic tank, and pass carbon dioxide gas into the plastic tank at a rate of 20mL / min for 40min. In the flat plate filter, filter the filtrate to obtain the filter residue, put the filter residue in an oven, heat up to 90°C, and dry for 4 hours to obtain aluminum hydroxide powder; put the aluminum hydroxide powder in a high-pressure air flow machine, air flow Pulverize for 10 minutes to obtain superfine aluminum hydroxide powder with a particle size of 50 μm. Pour 200 g of superfine aluminum hydroxide powder into 500 mL of sodium silicate solution with a mass fraction of 30% to obtain a colloidal solution. Put the colloidal solution in Disperse at a high speed at a speed of 3000r / min in a high-speed disperser to obtain a dispersion glue; in parts by weight, mix 60 parts of polystyrene and 30 parts of vinyl acetate resin to obtain a mixed resin, and pour the mixed resin into a container with 60 In a...

example 2

[0028] Put 750mL of sodium aluminate solution with a mass fraction of 20% into a plastic tank, and pass carbon dioxide gas into the plastic tank at a rate of 25mL / min for 42min. Put it in a flat plate filter, filter and remove the filtrate to obtain the filter residue, put the filter residue in an oven, heat up to 95°C, and dry for 4.5 hours to obtain aluminum hydroxide powder; put the aluminum hydroxide powder in a high-pressure air flow machine , airflow pulverization for 12min to obtain superfine aluminum hydroxide powder with a particle size of 70 μm. Pour 210g of superfine aluminum hydroxide powder into 520mL of sodium silicate solution with a mass fraction of 30% to obtain a colloidal solution. The liquid is placed in a high-speed disperser and dispersed at a high speed of 3100r / min to obtain a dispersion glue; in parts by weight, 65 parts of polystyrene and 75 parts of vinyl acetate resin are mixed to obtain a mixed resin, and the mixed resin is poured into a container ...

example 3

[0030] Put 800mL of sodium aluminate solution with a mass fraction of 20% into a plastic tank, and pass carbon dioxide gas into the plastic tank at a rate of 30mL / min for 45min. In the flat plate filter, remove the filtrate by filtering to obtain the filter residue, put the filter residue in an oven, heat up to 100°C, and dry for 5 hours to obtain aluminum hydroxide powder; put the aluminum hydroxide powder in a high-pressure air flow machine, air flow Pulverize for 15 minutes to obtain superfine aluminum hydroxide powder with a particle size of 80 μm. Pour 220 g of superfine aluminum hydroxide powder into 550 mL of sodium silicate solution with a mass fraction of 30% to obtain a colloidal solution. Put the colloidal solution in Disperse at a high speed of 3300r / min in a high-speed disperser to obtain a dispersion glue; by weight, 70 parts of polystyrene and 40 parts of vinyl acetate resin are mixed to obtain a mixed resin, and the mixed resin is poured into a container with 70...

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PUM

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Abstract

The invention discloses a preparation method of high-precision photoresist and belongs to the technical field of photoetching. When carbon dioxide is used for carrying out carbonation decomposition ona sodium aluminate solution to prepare aluminum hydroxide powder, the causticity ratio of the sodium aluminate solution is reduced and the decomposition of an aluminum hydroxide crystal seed is inhibited; the granularity of aluminum hydroxide formed at the periphery becomes thin, so that the shrinkage rate is reduced when the photoresist is cured; in a curing process of the photoresist, part of aluminum hydroxide grains in a dispersed glue solution react with sodium silicate to generate nano silicon dioxide; surfaces of resin grains are covered with the nano silicon dioxide grains; modified epoxy acrylic resin utilizes a low-shrinkage additive which takes polystyrene with a similar curing shrinkage rate as a main material; the low-shrinkage additive is a core-shell-structure material andan inner core of the low-shrinkage additive is styrene; in a curing and shrinkage process, the steric hindrance is increased; the wavelength received by epoxy acrylate covered with the aluminum hydroxide grains is shorter, so that the photoetching precision of the photoresist is higher and the photoresist has a wide application prospect.

Description

technical field [0001] The invention discloses a preparation method of high-precision photoresist, which belongs to the technical field of photolithography. Background technique [0002] Photoresist, also known as photoresist, is a light-sensitive mixed liquid composed of three main components: photosensitive resin, sensitizer (see spectral sensitizing dye) and solvent. After the photosensitive resin is exposed to light, the photocuring reaction can quickly occur in the exposed area, so that the physical properties of the material, especially the solubility and affinity, will change significantly. After being treated with an appropriate solvent, the soluble part is dissolved to obtain the desired image. [0003] The technology of photoresist is complicated and there are many varieties. According to its chemical reaction mechanism and development principle, it can be divided into two types: negative gel and positive gel. It is negative gel that forms insoluble substance af...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004
CPCG03F7/004
Inventor 胡次兵邓博朱彩娣
Owner FOSHAN GAOMING DISTRICT ZHUAHE NEW MATERIAL TECH CO LTD
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